Plasma processing apparatus
AssigneeTokyo Ohka Kogyo Co., Ltd.
InventorsHisashi Hori, Kazuto Ohbuchi, Atsushi Matsushita, Kaoru Sakamoto
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AssigneeTokyo Ohka Kogyo Co., Ltd.
InventorsHisashi Hori, Kazuto Ohbuchi, Atsushi Matsushita, Kaoru Sakamoto
Estimating the term…
A plasma processing apparatus has first and second electrodes disposed around a tubular chamber for generating a plasma. Each of the first and second electrodes comprises a plurality of web-shaped electrode segments spaced by a constant distant and disposed substantially halfway around the chamber. Each of the web-shaped electrode segments has opposite ends fastened to a pair of respective insulators disposed diametrically opposite to each other across the chamber. The web-shaped electrode segments of the first electrode are electrically connected to each other by a conductor on one of the insulators, and the web-shaped electrode segments of the second electrode are electrically connected to each other by a conductor on the other conductors. The first electrode is connected to a high-frequency power supply, and the second electrode is connected to ground.
A plasma processing apparatus comprising:
A plasma processing apparatus according to 1, further comprising:
A plasma processing apparatus comprising:
A plasma processing apparatus comprising:
Dependencies are inferred from the claim text.