Compounding elements and use thereof

A method of treating a working surface comprising the steps of:

• (i) providing a compounding element comprising a buffing pad having a buffing surface, and a resiliently deformable skirt around the perimeter of the buffing surface projecting beyond the buffing surface and having a distal surface, with the area of the distal surface of the skirt being smaller than the area of the buffing surface of the buffing pad,
• (ii) applying a rubbing compound to the working surface to be treated and/or the buffing surface of the compounding element, and
• (iii) contacting the compounding element on the working surface and applying pressure to deform the skirt and bring the buffing surface in contact with the working surface to abrade the working surface while the skirt helps to retain the rubbing compound between the buffing surface and the working surface.

A compounding element adapted to be rotated and used with a rubbing compound in the finishing of a working surface, the compounding element being in the shape of a circular disc having an axis, said compounding element comprising a circular buffing pad having a buffing surface and a diameter of about 133.4 mm (5.25 inches) and a generally cylindrical skirt of resiliently deformable polymeric foam around the perimeter of the buffing surface, said skirt having a width radially of the compounding element of from about 5 to 25 mm (0.2 to 1 inch) and projecting beyond the buffing surface by a distance of from about 5 to 10 mm (0.2 to 0.4 inch) such that, in use, application of pressure to the compounding element on a working surface causes deformation of the skirt so that the buffing surface contacts the working surface and the skirt will help to retain the rubbing compound between the buffing surface and the working surface during rotation of the compounding element to finish the working surface.