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US 5,846,122 AGranted
Method and apparatus for polishing metal-soluble materials such as diamond
AssigneeLucent Technologies Inc.
InventorsJohn Edwin Graebner, Sungho Jin, Guenther Wilhelm Kammlott, Wei Zhu
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Abstract
Applicants have discovered a new method for fine polishing surfaces of metal-soluble materials such as diamond to the submicron level. The method involves applying to the material surface a polishing medium composed of metal powder and an acidic or basic carrier. The surface is then polished by high speed rubbing to a submicron finish. Several embodiments of apparatus for performing the polishing are described.
Claims7
A method for fine polishing a diamond material comprising the steps of:
- providing a surface of said material having a surface roughness of more than 50 .ANG.;
- applying to said surface a polishing medium comprising metal particles in a metal-dissolving carrier medium;
- maintaining said polishing medium at a temperature of less than 200.degree. C.;
- and
- rubbing said surface to produce a fine polished surface having a surface roughness reduced by at least 20 .ANG..
2 more elements
Dependencies are inferred from the claim text.