Photographic processor
AssigneeEastman Kodak Company
InventorsDavid L. Patton, John H. Rosenburgh
Life of this patent
Estimating the term…
Abstract
A method and apparatus for processing a photosensitive material through at least one processing solution for processing of a photosensitive material. The apparatus includes a transport mechanism for providing moving of the photosensitive material through the processor. A heater is provided in the processing tank for localized heating of the photosensitive material passing through the processing solution.
Claims29
A photographic processor for developing a photosensitive material, comprising:
- a processing tank containing a processing solution for processing of said photosensitive material;
- a transport mechanism for moving of said photosensitive material through said processing solution;
- and
- a heater for localized heating of said photosensitive material as it passes through said processing solution.
A photographic processor for developing photosensitive material, comprising:
- a processing section having a narrow processing channel for containing a processing solution for processing of said photosensitive material;
- a transport mechanism for moving of said photosensitive material through said processing solution;
- recirculation system for circulating said processing solution through said processing tank, said recirculation system comprising an exit provided in said channel for allowing said processing solution to exit said processing channel and an inlet for returning processing solution to said processing channel, said inlet comprising a slot nozzle positioned so as to extend across the width of said photosensitive material being transported through said processing solution, said slot nozzle being mounted in a low thermal conducting mounting member;
- and
- a heater positioned adjacent said slot nozzle and within said low thermal conductive material for heating of said nozzle such that processing solution is heated as it passes through said slot nozzle so as to provide localized heating of the photosensitive material upon which the processing solution leaving the nozzle impinges.
A photographic processor for developing a photosensitive material, comprising:
- a processing section having a processing channel for containing a processing solution for processing of photosensitive material;
- a rack disposed within said processing section for forming a narrow processing channel therewith;
- a nozzle for introducing processing solution into said processing tank, said nozzle being mounted to said rack in a mounting member which is made of a material having a low thermal conductivity;
- a recirculation system for recirculating processing solution through said processing channel and for impinging of said processing solution on the photosensitive material through said nozzle as it passes through said processing channel;
- the heater is provided adjacent said slot nozzle for heating of said slot nozzle imbedded within said material having a low thermal conductivity so as to provide localized heating of the processing solution passing through said nozzle and for impingement on the photosensitive material.
A method of processing a photosensitive material by passing the photosensitive material through a processing tank containing a processing solution, comprising the steps of:
- moving said photosensitive material through said processing solution;
- and
- localized heating of said photosensitive material as it passes through said processing solution so as to improve the chemical activity of the emulsion layers contained on the photosensitive material.
A photographic processor for developing photosensitive material, comprising:
- a processing tank containing processing solution for processing of said photosensitive material;
- a transport mechanism for moving of said photosensitive material through said processing solution;
- recirculation system for circulating said processing solution through said processing tank, said recirculation system includes an exit provided in said tank for removing processing solution therefrom and an inlet for returning processing solution to said processing tank, said inlet comprising a slot nozzle positioned so as to extend across the width of said photosensitive material being transported through said processing solution, said slot nozzle being mounted in a low thermal conducting mounting member;
- and
- a heater disposed adjacent said slot nozzle and within said low thermal conductive material for heating of said nozzle such that processing solution is heated as it passes through said slot nozzle so as to provide localized heating of the photosensitive material upon which the processing solution leaving the nozzle impinges.
Dependencies are inferred from the claim text.