A lithographic device with a machine frame which, seen parallel to a vertical Z-direction, supports in that order a radiation source, a mask holder, a focusing system with a main axis directed parallel to the Z-direction, and a substrate holder which is displaceable perpendicularly to the Z-direction by means of a first positioning device with an object table and a drive unit by which the object table is displaceable parallel to at least an X-direction over a guide which is fastened to a frame of the first positioning device, wherein the first positioning device is provided with a force actuator system controlled by an electric controllerand exerting a compensation force on the frame during operation, the electric controller comprising a feedforward control loop and the compensation force has a mechanical moment about a reference point of the frame having a value equal to a value of a mechanical moment of a force of gravity acting on the object table about said reference point, and a direction which is opposed to a direction of the mechanical moment of said force of gravity, wherein the frame of the first positioning device belongs to the machine frame of the lithographic device, while the force actuator system of the first positioning device exerts the compensation force on the machine frame.