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US 5,844,205 AGranted
Heated substrate support structure
AssigneeApplied Komatsu Technology, Inc.
InventorsJohn M. White, Larry Chang
Life of this patent
Estimating the term…
Abstract
A heated substrate support plate for use in a process chamber. The support plate has grooves disposed therein for receiving heating elements. The heating elements are comprised of an outer sheath, a heater coil and a heat-conducting filler material. The heating element is disposed within a groove and compressed to compact the heat-conducting filler material about the heater coil.
Claims19
A substrate support structure for heating and supporting a substrate in a processing chamber, comprising:
- a plate including a groove in a surface thereof having a width and a depth wherein the depth of the groove is less than the width;
- and
- a heating element having an outer sheath having a diameter substantially equal to the width of the groove, a heater coil and a heat-conducting filler material disposed therebetween, said heating element initially positioned in said groove such that an upper portion of the outer sheath extends substantially above said surface and wherein said heating element is thereafter compacted such that said outer sheath is deformed by compression so that said outer sheath is substantially flush with said surface with said heat-conducting filler material compacted about said heater coil.
A substrate support structure for heating and supporting a substrate in a processing chamber, comprising:
- a plate including first and second channels in a surface thereof, said channels having a width and a depth where the depth of the channels is less than the width and where the channels are configured so that they do not cross one another;
- and
- first and second heating elements each having an outer sheath having a diameter substantially equal to the width of the channels, a heater coil and a heat-conducting filler material disposed therebetween, said first and second heating elements initially positioned in a corresponding one of said first and second channels such that an upper portion of the outer sheath extends substantially above the surface and wherein said heating element is thereafter compacted such that said outer sheath is deformed by compression so that said outer sheath is substantially flush with the surface and said heat-conducting filler material is compacted about said heater coil of said first and second heating elements.
A substrate support structure for heating and supporting a substrate in a processing chamber, comprising:
- a top plate having a top surface and bottom surface, said top surface for supporting said substrate;
- a bottom plate having a top surface joined to said bottom surface of said top plate;
- one of said top plate and said bottom plate including a groove having a first depth;
- and
- a heating element having an outer sheath with a diameter substantially larger than said first depth, a heater coil and a heat-conducting filler material disposed therebetween, said heating element initially positioned in said groove and extending above said top surface, and said outer sheath deformed by compression so that said heat-conducting filler material is compacted about said heater coil.
2 more elements
An apparatus, comprising:
- a vacuum processing chamber for processing a substrate at a substrate processing location therein;
- and
- a heated substrate support structure for supporting said substrate at said substrate processing location, said support structure including:
- (I) a base plate constructed from a first material and including a groove having a first depth, and
- (ii) a heating element having an outer sheath having a diameter substantially greater than said first depth and constructed from said first material, a heater coil and a heat-conducting filler material disposed therebetween, said heating element initially disposed within said groove and extending above a top surface of said base plate, said outer sheath deformed by compression so that said heat-conducting filler material is compacted about said heater coil.
2 more elements
An apparatus, comprising:
- a support plate for supporting a substrate in a processing chamber, said support plate including a base plate constructed from a first material and including a plurality of grooves in a surface thereof, said grooves having a width and a lesser depth, and forming inner and outer loops about said base plate, said outer loop extending about a path adjacent to a perimeter of said base plate and said inner loop extending about a path closer to a central portion of said base plate;
- a heating element disposed in each of said grooves, each of said heating elements including an outer sheath constructed from said first material and initially having a diameter substantially larger than said depth, a heater coil and a heat-conducting filler material disposed between said outer sheath and said heater coil;
- and
- said outer sheath of each of said heating elements deformable by compression so said heating elements fit within said grooves such that said outer sheath of each of said heating elements is flush with said top surface of said base plate and said heat-conducting filler material is compacted about said heater coil.
1 more element
A method of making a substrate support structure comprising:
- providing a plate including a groove in a surface thereof having a width and a depth less than the width;
- and
- providing a heating element having an outer sheath having a diameter substantially equal to the width of the groove, a heater coil and a heat-conducting filler material disposed therebetween;
- positioning said heating element in said groove such that an upper portion of the outer sheath extends substantially above the surface;
- and
- compacting said heating element so that said outer sheath is substantially flush with said surface and said heat conducting filler material is compacted about said heater coil.
3 more elements
Dependencies are inferred from the claim text.