US 5,843,603 AGranted

Method of evaluating shaped beam of charged beam writer and method of forming pattern

AssigneeKabushiki Kaisha Toshiba

InventorsAtsushi Ando, Hitoshi Sunaoshi, Hirotsugu Wada, Kazuyoshi Sugihara

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Abstract

A method of evaluating a shaped beam generated by a charged beam writer, comprises the steps of: a first step of shaping line beams by dividing into 1/n one side of the shaped beam having a dimension "a" in an x direction and a dimension "b" in a y direction perpendicular to the x direction, where n is the number of divisions; a second step of irradiating the shaped line beam upon a surface of the sample or the movable stage for a constant time or longer; a third step of shaping a beam by adding a bias value .delta. to each line beam width in the divided direction; a fourth step of irradiating the line beam obtained by adding the bias value to the shaped line beam upon a photosensitive substance on the sample surface for a constant time for exposure; a fifth step of repeating the fourth step exposure (n-1) times by shifting the line beam obtained by adding the bias value to the line beam, in the direction that one side of the shaped beam is divided into 1/n, and developing the photosensitive substance, to obtain a pattern width .theta.; a sixth step of repeating the above first to fifth steps by changing the number of divisions n and the bias value .delta.; and a seventh step of obtaining a change rate .DELTA..theta./.DELTA.n of the pattern width .theta. relative to the number of divisions n for each bias value .delta., to obtain an offset drift rate on the basis of the obtained change rate and the bias value. The method can evaluate a beam offset drift rate between the set beam dimension and the actual beam dimension, so that a microscopic pattern can be formed at a high precision.

Claims8

Dependent claims

A method of forming a pattern by use of a charged beam, by deflecting a charged beam passed through a first shaping aperture, by shaping a variable shaped beam by controlling dimensions of the charged beam passed through a second shaping aperture, and by forming a desired pattern on a sample mounted on a movable stage, which comprises the steps of:

a step of obtaining an offset drift rate of the charged beam;
a step of setting a dimension of the charged beam at a target beam dimension;
a step of correcting the target beam dimension under consideration of the obtained offset drift rate;
and
a step of forming a pattern on the basis of the corrected target beam dimension,
said obtaining an offset drift step comprising the steps of:
a first step of shaping a line beam by dividing into 1/n one side of a shaped beam having a dimension "a" in an x direction and a dimension "b" in a y direction perpendicular to the x direction, where n is the number of divisions;
a second step of irradiating the divided line beam upon a surface of the sample or the movable stage for a constant time or longer;
a third step of shaping a line beam by adding a bias value .delta. to each divided line beam width in the divided direction;
a fourth step of irradiating the shaped line beam obtained by adding the bias value to the divided line beam upon a photosensitive substance on the sample surface for a constant time for exposure;
a fifth step of repeating the fourth step exposure (n-1) times by shifting the shaped line beam obtained by adding the bias value to the divided line beam, in the direction that one side of the shaped beam is divided into 1/n, and developing the photosensitive substance, to obtain a pattern width .theta.;
a sixth step of repeating the above first and fifth steps by changing the number of divisions n and the bias value .delta.;
and
a seventh step of obtaining a change rate .DELTA..theta./.DELTA.n of the pattern width .theta. relative to the number of divisions n for each bias value .delta., to obtain an offset drift rate on the basis of the obtained change rate and the bias value.

11 more elements

a step of obtaining an offset drift rate of the charged beam;
a step of setting a dimension of the charged beam at a target beam dimension;
a step of correcting the target beam dimension under consideration of the obtained offset drift rate;
and
a step of forming a pattern on the basis of the corrected target beam dimension;
said obtaining an offset drift step comprising the steps of:
a first step of shaping a line beam by dividing into 1/n one side of the shaped beam having a dimension "a" in an x direction and a dimension "b" in a y direction perpendicular to the x direction, where n is the number of divisions;
a second step of irradiating the divided line beam upon a surface of the sample or the movable stage for a constant time or longer;
a third step of shaping a line beam by adding a bias value .delta. to each divided line beam width in the divided direction;
a fourth step of repeating n times an irradiation of the line beam obtained by adding the bias value to the divided line beam into an electric charge measurement instrument for a constant time, to obtain a sum total Value .SIGMA. of amount of n-time irradiating electric charge;
a fifth step of repeating the above first to fourth steps by changing the number of divisions n and the bias value .delta.;
and
a sixth step of obtaining a change rate .DELTA..SIGMA./.DELTA.n of the sum total Value .SIGMA. of amount of the irradiation electric charge relative to the number of divisions n for each bias value .delta., to obtain an offset drift rate on the basis of the obtained change rate and the bias value.

10 more elements

Dependencies are inferred from the claim text.