Insulator cure process for giant magnetoresistive heads

A method for forming a giant magnetoresistive device comprising the steps of:

• providing a substrate;
• forming a patterned shield layer on the substrate;
• forming a first read spacer on the patterned shield layer;
• forming a giant magnetoresistive (GMR) sensor on the first read spacer;
• forming a second read spacer on the GMR sensor;
• forming a shared shield/pole structure over the second read spacer;
• forming a first patterned layer of uncrosslinked polymer over the shared shield/pole structure;
• crosslinking the first patterned layer by electron irradiation at a temperature less than about 175 C.;
• forming a conductive coil on the cured first patterned layer;
• forming a second layer patterned layer of uncrosslinked polymer over the conductive coil;
• crosslinking the second patterned layer by electron irradiation at a temperature less than about 175 C.;
• and
• forming a second pole piece layer of magnetic material to complete the magnetic head.