Substrate transport apparatus
AssigneeNikon Corporation
InventorKenji Nishi
Life of this patent
Estimating the term…
Abstract
A wafer cassette for storing a wafer is provided vertically above (direction Z) a transport path for a wafer which is carried by a robot arm driven by a drive mechanism to move along a transport guide extending from a wafer inlet from a wafer outlet. The wafer cassette is disposed at a position between the inlet and a pre-alignment mechanism. The wafer cassette is supported by a cassette retaining base. Drive members driven by a wafer up-down mechanism are fixed to both ends of the cassette retaining base which face opposite each other in a direction perpendicular to the transport path. Thus, the wafer cassette is vertically moved by the wafer up-down mechanism to deliver a wafer between the robot arm and the wafer cassette.
Claims23
An exposure apparatus comprising:
- a substrate stage by which a substrate is supported in a position at which the substrate is irradiated with exposure light;
- a pre-alignment mechanism which pre-aligns said substrate before the substrate is positioned on said substrate stage;
- a first transport system which transports the substrate while supporting the same in a generally vertical position, thereafter changes of the posture of the substrate into a horizontal position and transfers the same to said pre-alignment mechanism;
- and
- a second transport system which transfers said substrate from said pre-alignment mechanism to said substrate stage.
An exposure apparatus comprising:
- a substrate stage having a support surface on which a substrate is supported in a position at which the substrate is irradiated with exposure light;
- a transport system which transports said substrate from a transport initiation position to said support surface, said transport system being provided with a supporting mechanism which supports the substrate in a generally vertical position in at least a part of the way from said transport initiation position to said support surface;
- and
- a pre-alignment mechanism provided in a path of transportation of the substrate from said transport initiation position to said support surface to pre-align said substrate, wherein said supporting mechanism supports the substrate in an upright position with respect to the plane of said support surface during transportation of the substrate from said transport initiation position to said pre-alignment mechanism.
A method of transporting a substrate for exposure on a substrate stage, comprising the steps of:
- transporting the substrate along a path, while supporting the substrate in a generally vertical position;
- changing the orientation of the substrate into a generally horizontal position;
- transferring the substrate to a pre-alignment mechanism;
- and
- transferring the substrate from the pre-alignment mechanism to the substrate stage.
A method of transporting a substrate for exposure on a substrate stage, comprising the steps of:
- transporting a substrate along a path while supporting the substrate in a generally vertical position, by a first transport system,
- changing the orientation of the substrate into a generally horizontal position, by the first transport system,
- transferring said substrate to a support surface on the substrate stage.
An exposure apparatus comprising:
- a substrate stage having a support surface on which a substrate is supported in a position at which the substrate is irradiated with exposure light;
- a transport system which transports said substrate from a transport initiation position to said support surface, said transport system being provided with a supporting mechanism which supports the substrate in a generally vertical position in at least a part of the way from said transport initiation position to said support surface;
- and
- a pre-alignment mechanism which supports said substrate in a horizontal position to pre-align in said path of transportation of the substrate from said transport initiation position to said support surface.
A method for making an exposure apparatus, the method comprising the steps of:
- providing a substrate stage having a support surface on which a substrate is supported in a position at which the substrate is irradiated with exposure light;
- providing a transport system which transports said substrate from a transport initiation position to said support surface, said transport system being provided with a supporting mechanism which supports the substrate in a generally vertical position in at least a part of the way from said transport initiation position to said support surface;
- and
- providing a pre-alignment mechanism which supports said substrate in a horizontal position to pre-align in said path of transportation of the substrate from said transport initiation position to said support surface.
Dependencies are inferred from the claim text.