Covalent carbon nitride material comprising C.sub.2 N and formation method
AssigneePresident and Fellows of Harvard College
InventorsCharles M. Lieber, Z. John Zhang, Chunming Niu
Life of this patent
Estimating the term…
Abstract
A nitride material comprises C.sub.2 N. A method of forming a covalent carbon material includes forming an atomic nitrogen source, forming an elemental reagent source and combining the atomic nitrogen, elemental reagent to form the covalent carbon material and annealing the covalent carbon material. The elemental reagent is reactive with the atomic nitrogen of the atomic nitrogen source to form the covalent carbon material. Annealing the covalent carbon material produces the C.sub.2 N. In one embodiment, essentially all carbon nitride chemical bonds are single or double bonds.
Claims39
A composition comprising C.sub.2 N.
A nitride material wherein at least a portion of the material has an empirical formula of C.sub.2 N.
A composite, comprising:
- a) a substrate;
- and
- b) an covalent nitride material on said substrate, at least a portion of said covalent nitride material having an empirical formula of C.sub.2 N.
A nitride material wherein at least a portion of said material has an empirical formula of C.sub.2 N, the material being formed by a method comprising the steps of:
- a) forming an atomic nitrogen source;
- b) forming an elemental carbon source, said elemental carbon source including elemental carbon which is reactive with atomic nitrogen of said atomic nitrogen source to form the covalent carbon nitride material;
- c) combining the atomic nitrogen and the elemental carbon to cause the atomic nitrogen and the elemental carbon to react and form a covalent carbon nitride material;
- and
- d) annealing said covalent carbon nitride material, whereby an annealed covalent carbon nitride material is formed wherein at least a portion of said annealed covalent carbon nitride material has an empirical formula of C.sub.2 N.
Dependencies are inferred from the claim text.