Compact, selfshielded electron beam processing technique for three dimensional products
AssigneeElectron Processing Systems, Inc.
InventorSamuel V. Nablo
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Abstract
A compact, selfshielded electron beam processing technique for three dimensional products includes a treatment zone bounded by at least one material of high atomic number. Energetic electrons are directed into the treatment zone in such a manner that electron reflection from the boundary of the treatment zone assists in filling the treatment zone with energetic electrons. The products to be treated are caused to travel through the treatment zone without any mechanical contact therewith (such as by ballistic or pneumatic techniques).
Claims13
Method of irradiating a product with electrons, comprising the following steps:
- directing high-energy electrons into a treatment zone at atmospheric pressure lined with high atomic number material so that a high anisotropy of electron direction results in the treatment zone, and
- orienting said treatment zone so that said product can be passed through it in free-fall without any direct or occluding contact with said product, which contact would otherwise prevent electrons from reaching all surfaces of said product.
Apparatus for irradiating a product with electrons, said product having a contoured, molded surface, said apparatus comprising in combination
- a cavity defined by a wall having an electron window, said cavity being maintained at atmospheric pressure,
- means for releasing said product having said contoured, molded surface at a point above said cavity so that it falls in free-fall through said cavity with a known entrance velocity and a known exit velocity, and
- means for directing high energy electrons through said electron window.
Dependencies are inferred from the claim text.