Systems for the treatment of chemical wastes and methods for treating chemical wastes
AssigneeThermatrix, Inc.
InventorsAnn C. Heywood, Richard J. Martin, John D. Stilger, Andrew B. King
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Abstract
Improved methods for the treatment of liquid chemical compounds and process systems for practicing those methods are provided. The methods are practiced by spraying the liquid chemical compounds into a matrix bed of heat resistant materials at temperatures sufficiently high to oxidize the chemical compounds. The sprayed liquid chemical compound is preferably heated to its gaseous state prior to contacting the matrix bed. Processing steps for removing coke deposits in the matrix bed are also provided. The methods are particularly advantageous for the destruction of chemical agents and munitions.
Claims22
A method for the destruction of organic, liquid chemical compounds, comprising the steps of:
- (a) providing a thermal oxidizer containing a matrix bed of heat resistant material;
- (b) feeding a liquid, organic chemical compound into a spray nozzle to form spray droplets of the chemical compound;
- (c) heating the spray droplets of the chemical compound to their gaseous state;
- and
- (d) oxidizing the chemical compound within a portion of the matrix bed maintained at a temperature of at least 1400.degree. F.
A method for the destruction of liquid chemical compounds, comprising the steps of:
- (a) vaporizing a liquid chemical compound to form a gas or fluid state comprising the chemical compound;
- (b) flowing the vaporized liquid chemical compound into a thermal oxidizer comprising a matrix bed of heat resistant material;
- and
- (c) oxidizing the vaporized liquid chemical compound within the matrix bed at a temperature of at least about 1400.degree. F. to destroy the chemical compound.
A thermal oxidizer for treating and destroying liquid chemical compounds, comprising:
- (a) an inlet chamber for receiving a spray of a liquid chemical compound and for vaporizing the liquid chemical compound within the inlet chamber;
- (b) an outlet for removing reaction gaseous products from the thermal oxidizer;
- (c) a gaseous oxidation section located between the inlet and the outlet comprising a matrix bed of heat resistant material;
- wherein said inlet chamber is substantially hollow and extends into the matrix bed of heat resistant material in the direction of the flow of the reactants through the oxidizer;
- and
- (d) a spray nozzle having a feed inlet to receive the liquid chemical compound and an outlet extending into the inlet chamber.
A process system for treating and destroying a liquid chemical compound, comprising:
- (1) a thermal oxidizer comprising
- (a) an inlet chamber for receiving a spray of a liquid chemical compound and for vaporizing the liquid chemical compound;
- (b) an outlet for removing reaction gaseous products from the thermal oxidizer;
- (c) a gaseous oxidation section located between the inlet and the outlet comprising a matrix bed of heat resistant material;
- wherein said inlet chamber is substantially hollow and extends into the matrix bed of heat resistant material in the direction of the flow of the reactants through the oxidizer;
- and
- (d) a spray nozzle having a feed inlet to receive the liquid chemical compound and an outlet extending into the inlet chamber;
- and
- (2) means for transporting the liquid chemical compound to the inlet of the spray nozzle.
Dependencies are inferred from the claim text.