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US 5,812,412 AGranted
Charged beam pattern data generating method and a charged beam pattern data generating apparatus
AssigneeMitsubishi Denki Kabushiki Kaisha
InventorsKoichi Moriizumi, Kinya Kamiyama, Makoto Kanno, Hironobu Taoka, Hiroomi Nakao, Kazuhiro Yamazaki
Life of this patent
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Abstract
A charged beam pattern data generating method for generating high quality pattern data from the circuit layout design data of a semiconductor device for use by a charged beam drawing apparatus in the production of resist patterns or other semiconductor device manufacturing processes.
Claims27
A charged beam pattern data generating method comprising:
- a data receiving step for receiving design layout data;
- an automatic critical dimensions (CD) area separating step for separating critical dimensions areas requiring high dimensional precision contained in the design layout data;
- a basic geometric shape separating step for dividing polygons remaining after the automatic critical dimensions (CD) area separating step, into basic geometric shapes;
- wherein the automatic critical dimensions (CD) area separating step is performed before the basic geometric shape separating step;
- and
- a generating step for generating the charred beam pattern data using the basic geometric shapes.
3 more elements
A charged beam pattern data generating method comprising:
- a data receiving step for receiving design layout data;
- a triangle separation step for separating right triangle components from polygons contained in the design layout data;
- and
- a generating step for generating the charred beam pattern data using the right triangle components.
1 more element
A charged beam pattern data generating method comprising:
- a data receiving step for receiving design layout data;
- and
- a basic geometric shape separation step for selecting the best separation results from the design layout data based on a predetermined evaluation standard from a plurality of separation results formed by sequentially inserting dividing lines from each vertex of a polygon;
- and
- a generating step for generating the charged beam pattern data using the best separation results.
2 more elements
A charged beam pattern data generating method comprising:
- a data receiving step for receiving design layout data;
- a basic geometric shape separating step for dividing polygons contained in the design layout data into basic geometric shapes;
- a fine drawing data editing step for editing fine drawing data that can not be separated by the basic geometric shape separation step;
- and
- a generating step for generating the charred beam pattern data using the basic geometric shaves and the fine drawing data.
2 more elements
A charged beam pattern data generating method comprising:
- a data receiving step for receiving design layout data;
- an automatic chamfer member editing step for suppressing generation of fine drawing data by deleting or revising unnecessary chamfered members contained in the design layout data;
- and
- a generating step for generating the charged beam pattern data using the design layout data without the unnecessary chamfered members.
1 more element
A charged beam pattern data generating method comprising:
- a data receiving step for receiving design layout data;
- an automatic chamfer member editing step for suppressing generation of fine drawing data by revising slightly inclined sides that are not chamfered members contained in the design layout data;
- and
- a generating step for generating the charged beam pattern data using the design layout data and the slightly inclined sides that are not chamfer members.
1 more element
A charged beam pattern data generating method comprising:
- a data receiving step for receiving design layout data;
- an automatic chamfer editing step for suppressing generation of fine drawing data by deleting or revising unnecessary chamfered members contained in the design layout data;
- a triangle separating step for separating right triangle components from polygons contained in the design layout data;
- wherein the triangle separating step is performed after the automatic chamfer member editing step;
- and
- a generating step for generating the charged beam pattern data using the design layout data without unnecessary chamfer member and using the right triangle components.
3 more elements
A charged beam pattern data generating apparatus comprising:
- data receiving means for receiving design layout data;
- an automatic critical dimensions (CD) area separating means for separating critical dimensions areas requiring high dimensional precision contained in the design layout data;
- and
- generating means for generating the charged beam pattern data using the critical dimension areas.
1 more element
A charged beam pattern data generating apparatus comprising:
- data receiving means for receiving design layout data;
- a triangle separation means for pre-separating right triangle components from polygons contained in the design layout data;
- and
- generating means for generating the charged beam pattern data using the right triangle components.
1 more element
A charged beam pattern data generating apparatus comprising:
- data receiving means for receiving design layout data;
- automatic critical dimensions extraction means for scanning polygon widths to automatically extract critical dimensions areas contained in the design layout data using extracted critical dimensions;
- means for inputting the extracted critical dimensions to said automatic critical dimensions (CD) area separating means;
- and
- generating means for generating the charred beam pattern data using the extracted critical dimensions areas.
2 more elements
A charged beam pattern data generating apparatus comprising:
- data receiving means for receiving design layout data;
- basic geometric shape separation means for selecting the best separation results from the design layout data based on a predetermined evaluation standard from among plural separation results formed by sequentially inserting dividing lines from each vertex of a polygon;
- and
- generating means for generating the charged beam pattern data using the best separation results.
1 more element
A charged beam pattern data generating apparatus comprising:
- data receiving means for receiving design layout data;
- fine drawing data editing means for editing fine drawing data contained in the design layout data that can not be processed by a basic geometric shape separation device;
- and
- generating means for generating the charged beam pattern data using the fine drawing data.
1 more element
A charged beam pattern data generating apparatus comprising:
- data receiving means for receiving design layout data;
- and
- an automatic chamfer member editing means for suppressing generation of fine drawing data by deleting or revising unnecessary chamfered members contained in the design layout data;
- and
- generating means for generating the charged beam pattern data without the unnecessary chamfered members.
2 more elements
A charged beam pattern data generating apparatus comprising:
- data receiving means for receiving design layout data;
- an automatic chamfer member editing means for suppressing generation of fine drawing data by revising slightly inclined sides that are not chamfered members contained in the design layout data;
- and
- generating means for generating the charred beam pattern data using the design layout data and the slightly inclined sides that are not chamfered members.
1 more element
Dependencies are inferred from the claim text.