Photosensitive printing plate
AssigneeFuji Photo Film Co., Ltd.
InventorsNobuyuki Nishimiya, Hiroyuki Nagase
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Abstract
A negative photosensitive lithographic printing plate comprising an aluminum or organic polymer support having a surface roughness Ra of 0.25 to 0.60 .mu.m and having provided thereon a photopolymerizable photosensitive layer comprising a polymerizable monomer, a photopolymerization initiator and a sensitizer having an absorbing wavelength of 400 to 1,000 nm, wherein the support has a functional group on its surface at the side of the photosensitive layer, and wherein the functional group has an unsaturated bond which can undergo a radical addition reaction and an Si atom which covalently bonds to an aluminum atom, an Si atom, or a carbon atom in the support via an oxygen atom.
Claims15
A negative photosensitive lithographic printing plate comprising an aluminum or organic polymer support having a surface roughness Ra of 0.25 to 0.60 .mu.m and having provided thereon in sequence,
- (a) a layer containing an organic-inorganic composite formed by coating a solution containing a polymer having a Si--O--Si bond, which is obtained by subjecting an organic silicon compound represented by formula (1) and an organic silicon compound represented by formula (3) to hydrolysis and polycondensation, followed by drying:
- R.sub.1 Si(R.sub.2).sub.3 ( 1)
- Si(R.sub.4).sub.4 ( 3)
- wherein R.sub.1 represents an addition-reactive functional group;
- and R.sub.2 represents a hydrolyzable alkoxy group or --OCOCH.sub.3 ;
- and R.sub.4 represents a hydrolyzable group, and
- (b) a photopolymerizable photosensitive layer comprising a polymerizable monomer, a photopolymerization initiator and a sensitizer having an absorption wavelength of 400 to 1,000 nm.
A negative photosensitive lithographic printing plate prepared by:
- on an aluminum or organic polymer support having a surface roughness Ra of 0.25 to 0.60 .mu.m,
- (a) coating a solution containing a polymer having a Si--O--Si bond, which is obtained by subjecting an organic silicon compound represented by formula (1) and an organic silicon compound represented by formula (3) to hydrolysis and polycondensation, followed by drying:
- R.sub.1 Si(R.sub.2).sub.3 ( 1)
- Si(R.sub.4).sub.4 ( 3)
- wherein R.sub.1 represents an addition-reactive functional group;
- and R.sub.2 represents a hydrolyzable alkoxy group or --OCOCH.sub.3 ;
- and R.sub.4 represents a hydrolyzable group, and
- (b) subsequently forming a photopolymerizable photosensitive layer comprising a polymerizable monomer, a photopolymerization initiator and a sensitizer having an absorption wavelength of 400 to 1,000 nm.
A negative photosensitive lithographic printing plate comprising an aluminum or organic polymer support having a surface roughness Ra of 0.25 to 0.60 .mu.m and having coated thereon an organic silicon compound represented by formula (1):
- R.sub.1 Si(R.sub.2).sub.3 ( 1)
- wherein R.sub.1 represents an addition-reactive functional group and R.sub.2 represents a hydrolyzable alkoxy group or --OCOCH.sub.3, said support having on the organic silicon compound coated side a photopolymerizable photosensitive layer comprising a polymerizable monomer, a photopolymerization initiator and a sensitizer having an absorption wavelength of 400 to 1,000 nm.
Dependencies are inferred from the claim text.