Method for producing a plated-through hole on a printed-circuit board
AssigneeBlaupunkt-Werke GmbH
InventorsWolf Backasch, Rolf Hohmann
Life of this patent
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Abstract
A method for producing a plated-through hole on a printed-circuit board, whereby the printed-circuit board is initially bored, catalyzed, and patterned. The plated-through hole is then fashioned in an electrochemical deposition process so as to make it functional for the through-hole mounting of electrical components. The plating process is preferably carried out with nickel or nickel compounds, so that no additional corrosion protection is required. A direct bonding to the contact lands can be achieved by coating the contact lands with gold or palladium.
Claims9
A method for producing a plated-through hole on a printed-circuit board having an upper copper-plated surface on an upper side of the board and a lower copper-plated surface on a lower side of the board for forming annular copper surfaces and interconnect traces and bores positioned at predetermined locations, each of the bores having an inner wall, the method comprising the steps, in the order recited, of:
- applying an adhesive promoter to the inner wall of each of the bores using an electrochemical deposition process;
- applying an annularly shaped etch resist layer to the upper copper-plated surface and the lower copper-plated surface surrounding each of the bores, the etch resist layer at least partially covering each of the bores and the interconnect traces;
- etching away uncovered portions of the upper copper-plated surface and the lower copper-plated surface to form the annular copper surfaces and the interconnect traces;
- removing the etch resist layer from at least the annular copper surfaces and the bores;
- and
- electroconductively coupling the annular copper surfaces to the inner wall of each of the bores with the adhesive promoter using an electrochemical plating.
A method for producing a plated-through hole on a printed-circuit board having an upper copper-plated surface and a lower copper-plated surface for forming annular copper surfaces and interconnect traces, and bores positioned at predetermined locations, each of the bores having an inner wall, the method comprising the steps, in the order recited, of:
- applying an annularly shaped etch resist layer to the upper copper-plated surface and the lower copper-plated surface surrounding each of the bores, the etch resist layer at least partially covering each of the bores and the interconnect traces,
- etching away uncovered portions of the upper copper-plated surface and the lower copper-plated surface to form the annular copper surfaces and the interconnect traces;
- removing the etch resist layer from at least the annular copper surfaces and the bores;
- applying an adhesive promoter including a catalyst to the inner wall of each of the bores using an electrochemical deposition process;
- and
- electroconductively coupling the annular copper surfaces to the inner wall of each of the bores with the adhesive promoter using an electrochemical plating.
Dependencies are inferred from the claim text.