US 5,788,825 AGranted

Vacuum pumping system for a sputtering device

AssigneeSamsung Electronics Co., Ltd.

InventorsJeong-Ho Park, Kwan-Ki Seo

Life of this patent

Estimating the term…

Loading patent…

Abstract

In a vacuum pumping system, respective pumping assemblies for the reaction chamber and for the load lock chamber are separated from each other, and thereby the degree of vacuum in the reaction chamber is prevented from being degraded. The vacuum pumping system has a cryo pump for pumping the reaction chamber to have a first high degree of vacuum. A first pumping assembly pumps the load lock chamber to have a high degree of vacuum, and a second pumping assembly prevents the first high degree of vacuum from being degraded by pumping the reaction chamber. The second pumping assembly is separated from the cryo pump and the first pumping assembly so as to prevent the reaction chamber and the load lock chamber from being incorporated into one chamber when a wafer passes into and out of the reaction chamber.

Claims4

Dependent claims

A vacuum pumping system for a sputtering device, said sputtering device having a reaction chamber and a load lock chamber, said vacuum pumping system comprising:

a first means for evacuating said reaction chamber and said load lock chamber to a low degree of vacuum;
a second means for pumping said reaction chamber to have a first high degree of vacuum;
a third means for pumping said load lock chamber to have a second high degree of vacuum, said third means being separated from said second means;
a fourth means for pumping said reaction chamber to maintain said first high degree of vacuum, said fourth means being separated from said second means and from said third means so as to prevent said reaction chamber and said load lock chamber from being incorporated into one chamber when a wafer passes into and out of said reaction chamber, said fourth pumping means preventing said first high degree of vacuum from being degraded by pumping said reaction chamber;
and
a plurality of valves for respectively opening and closing a plurality of vacuum lines interconnected to said reaction chamber and said load lock chamber according to operations of said first, said second, said third, and said fourth means.

3 more elements

Dependencies are inferred from the claim text.