On-site manufacture of ultra-high-purity hydrofluoric acid for semiconductor processing
AssigneeStartec Ventures, Inc.
InventorsJoe G. Hoffman, R. Scot Clark
Life of this patent
Estimating the term…
Abstract
A system for purification and generation of hydrofluoric acid on-site at a semiconductor device fabrication facility. An evaporation stage (optionally with arsenic oxidation) is followed by a fractionating column to remove most other impurities, an Ionic Purifier column to suppress contaminants not removed by the fractionating column, and finally the HF Supplier (HFS).
Claims32
An on-site subsystem, in a semiconductor device fabrication facility, for providing ultra-high-purity reagents comprising HF to a semiconductor manufacturing operation, comprising:
- an evaporation source connected to receive an HF source and to provide a flow of HF vapor therefrom;
- said flow of HF vapor being connected to pass through an ionic purifier unit which provides a recirculating volume of high-purity water, containing a high concentration of HF in contact with said flow of HF vapor, wherein said purifier exhausts a small amount of HF gas;
- a generator unit, connected to receive said flow of HF vapor from said purifier and to combine said HF vapor with an aqueous liquid to produce an ultra-pure aqueous solution comprising hydrofluoric acid;
- and
- a piping connection which routes said aqueous solution to a point of use in the semiconductor device fabrication facility.
An on-site subsystem, in a semiconductor device fabrication facility, for providing ultra-high-purity reagents comprising HF to a semiconductor manufacturing operation, comprising:
- an evaporation source connected to receive HF and to provide a flow of HF vapor therefrom;
- said flow of HF vapor being connected to pass through an ionic purifier unit which provides a recirculating volume of high-purity water, containing a high concentration of HF in contact with said flow of HF vapor, wherein said purifier exhausts a small amount of HF gas;
- and
- a generator unit, connected to receive said flow of HF vapor from said purifier and to combine said HF vapor with an aqueous liquid to produce an ultra-pure aqueous solution comprising hydrofluoric acid;
- whereby said ultra-pure aqueous solution can be used within the semiconductor device fabrication facility without bulk transfer or exposure of liquid surface to any uncontrolled ambient atmosphere.
An on-site subsystem, in a semiconductor device fabrication facility, for providing ultra-high-purity HF for use in semiconductor manufacturing operations at said facility, comprising:
- an evaporation source connected to receive a liquid HF source and to provide a flow of HF vapor therefrom;
- said flow of HF vapor being connected to pass through an ionic-purifier unit which provides a recirculating volume of high-purity water, containing a high concentration of HF in contact with said flow of HF vapor;
- a dryer unit, connected to receive said flow of HF vapor from said purifier and to dry said HF vapor;
- and
- a piping connection which routes said vapor from said dryer to a point of use in the semiconductor device fabrication facility.
A system for producing ultra-high-purity reagents comprising HF, comprising:
- an evaporation source connected to receive an HF source and to provide a flow of HF vapor therefrom;
- said flow of HF vapor being connected to pass through an ionic purifier unit which provides a recirculating volume of high-purity water, containing HF in contact with said flow of HF vapor, wherein said purifier exhausts HF gas;
- and
- a generator unit, connected to receive said flow of HF vapor from said purifier and to combine said HF vapor with an aqueous liquid to produce an ultra-pure aqueous solution comprising hydrofluoric acid.
Dependencies are inferred from the claim text.