Chemical vapor deposition apparatus
AssigneeCanon Kabushiki Kaisha
InventorsTetsuo Asaba, Yasushi Kawasumi, Kazuaki Ohmi, Yasuhiro Sekine, Yukihiro Hayakawa
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Abstract
A chemical vapor deposition apparatus comprises a starting material container holding a starting material in a liquid state, a starting gas generating container into which the liquid starting material is fed from the starting material container, a means for keeping constant the liquid level of the liquid starting material held in the starting gas generating container, a means for injecting a bubbling gas from the outside into the liquid starting material held in the starting gas generating container, thereby bubbling the starting gas, and a reaction chamber into which a mixed gas of the starting gas and the bubbling gas are fed.
Claims7
A unit for vaporizing a liquid starting material into a vaporized starting material and supplying the vaporized starting material to a chemical vapor deposition apparatus, the unit comprising:
- a container for storing a liquid starting material provided with a first heater;
- a capillary tube having a tip, said tip being positioned so that it is in contact with the bottom of the container to supply a bubbling gas into the container;
- a condenser for cooling the vaporized starting material provided downstream of the container;
- and
- a second heater for heating the vaporized starting material provided downstream of the condenser,
- wherein the first heater heats the liquid starting material to a temperature equal to or greater than the boiling point of the starting material, and the second heater maintains a temperature below the temperature provided by the first heater.
A chemical vapor deposition apparatus provided with a unit for vaporizing a liquid starting material into a vaporized starting material, the unit comprising:
- a container for storing a liquid starting material provided with a first heater;
- a capillary tube having a tip, said tip being positioned so that it is in contact with the bottom of the container to supply a bubbling gas into the container;
- a condenser for cooling a vaporized starting material provided downstream of the container;
- and
- a second heater for heating the vaporized starting material provided downstream of the condenser,
- wherein the first heater heats the liquid starting material to a temperature equal to or greater than the boiling point of the starting material, and the second heater maintains a temperature below the temperature provided by the first heater.
A chemical vapor deposition apparatus comprising:
- (a) a container to contain a liquid starting material;
- (b) first heating means adapted to heat the liquid starting material to a temperature equal to or greater than its boiling point at operating pressure within said container;
- (c) gas feed means to introduce a carrier gas into said container at a constant flow rate, wherein said gas feed means comprises an injection capillary tube having a tip, said tip being positioned to be in contact with the bottom of said container in order to bubble the carrier gas into the liquid starting material;
- (d) a reflux condenser connected to said container to cool a starting gas produced by vaporizing the liquid starting material;
- and
- (e) means to maintain the operating temperature of said reflux condenser wherein the cooled starting gas is a saturated vapor and condensed liquid is returned to said container.
Dependencies are inferred from the claim text.