Method and system for manufacture of field emission display
AssigneeMicron Display Technology, Inc.
InventorRobert T. Rasmussen
Life of this patent
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Abstract
High resolution color displays for field emission displays are formed by applying a grille to a screen layer, the grille having a set of holes formed therein exposing areas of the screen layer. A layer of photoresist is applied to the grille and the exposed areas of the screen layer, whereby a plurality of photoresist-covered screen layer areas are defined. One set of the plurality of photoresist-covered screen layer areas is fixed, whereby a fixed set and an unfixed set are defined. The photoresist is removed from the unfixed set and a light emitting substance is deposited on the exposed screen layer area. The fixed set of photoresist is plasma etched.
Claims18
A method for producing high resolution displays, comprising the steps of:
- providing a screen surface;
- applying a grille to the screen surface, the grille having a set of holes formed therein to define a plurality of exposed set areas of the screen surface;
- applying a layer of photoresist to the grille and the plurality of exposed set areas, to define a plurality of photoresist-covered exposed set areas;
- exposing said layer of photoresist to light to fix one photoresist-covered exposed set area of the plurality of photoresist-covered exposed set areas and to provide a fixed set area and an unfixed set area;
- removing the photoresist from the unfixed set area to define a pattern;
- depositing a light emitting substance on the pattern;
- and
- plasma etching the fixed set area of photoresist.
A method for producing high resolution displays, comprising the steps of:
- providing a screen surface;
- depositing an electrically conductive coating over the screen surface;
- applying a grille to the electrically conductive coating, the grille having a set of holes formed therein to define a plurality of exposed set areas of the electrically conductive coating;
- applying a layer of photoresist to the grille and the exposed set areas of electrically conductive coating to define a plurality of photoresist-covered exposed set areas of the electrically conductive coating;
- exposing the layer of photoresist to light to fix one set of the plurality of photoresist-covered exposed set areas of the electrically conductive coating and to define a fixed set area and an unfixed set area;
- removing the photoresist from the unfixed set area to define a pattern;
- depositing a light emitting substance on the pattern;
- and
- plasma etching the fixed set area of photoresist.
Dependencies are inferred from the claim text.