US 5,762,544 A · Carrier head design for a chemical mechanical polishing apparatus

Abstract

A carrier head uses a pressure chamber and a gimbal. The gimbal allows the carrier base to pivot with respect to the drive shaft about a point at the interface between the substrate and the polishing pad. The gimbal may "float" so that no downward force is applied to the substrate through the gimbal. A rolling diaphragm seals the carrier base to the carrier housing to form a chamber. By pressurizing the chamber, an even load can be applied across the substrate. A retaining ring is independently loaded by an inflatable bladder. Torque is transferred from the carrier housing to the carrier base by horizontal pins positioned near the substrate. The pins can slide vertically in the housing, but not laterally. However, there is sufficiently elasticity to allow the torque pins to comply with manufacturing tolerances so that both torque pins bear the rotational load.

Claims23

Dependent claims

A carrier head for a chemical mechanical polishing apparatus comprising:

a housing connectable to a drive shaft to rotate with said drive shaft about a first axis;
a base to hold a substrate against a polishing pad, said base connected to said housing to rotate about said first axis;
a loading mechanism to cause said base to press said substrate against said polishing pad;
and
a gimbal mechanism pivotally and slidably connecting said housing to said base to permit said base to pivot with respect to said housing and to transmit horizontal forces from said base to said housing.

2 more elements

Dependencies are inferred from the claim text.

Carrier head design for a chemical mechanical polishing apparatus

Life of this patent

Carrier head design for a chemical mechanical polishing apparatus

Life of this patent

Abstract

Claims23