Plasma processing apparatus

A plasma processing apparatus comprising:

• a processing chamber comprising means for forming a plasma discharge for surface processing of substrates;
• a first load-lock chamber whereto through passage from said processing chamber is allowed by a first opening formed in a first wall portion of said processing chamber;
• a second load-lock chamber whereto through passage from said processing chamber is allowed by a second opening formed in a second wall portion of said processing chamber;
• a gate element, supported within said processing chamber, for reciprocatively opening and closing the aforementioned first and second load lock chambers by moving within said processing chamber;
• a first transport boat, affixed to a side of said gate element facing said first load-lock chamber, which is adapted to hold a substrate, position said substrate in said first load-lock chamber when said gate element closes said first opening, and position said substrate in said processing chamber when said gate element closes said second opening;
• and
• a second transport boat, affixed to a side of said gate element facing said second load-lock chamber, which is adapted to hold a substrate, position said substrate in said second load-lock chamber when said gate element closes said second opening, and position said substrate in said processing chamber when said gate element closes said first opening.