A method of fabricating a display device having a first substrate, a transparent conductive film formed on said first substrate and forming a plurality of first conducting lines extending in a first direction, a first semiconductor integrated circuit connected with said first conducting lines and having TFTs and extending in a second direction substantially perpendicular to said first direction, a second substrate, a second transparent conductive film formed on said second substrate and forming a plurality of second conducting lines extending in said second direction, a second semiconductor integrated circuit connected with said second conducting lines and having TFTs, said second semiconductor integrated circuit extending in said first direction, said first and second substrates being so arranged that said first conducting lines are located opposite to said second conducting lines, said method comprising the steps of:
- forming said first and second semiconductor integrated circuits on their respective support substrates via their respective peeling layers;
- bonding said first and second semiconductor integrated circuits to said first and second substrates, respectively, thus forming a laminate;
- and
- processing said laminate with a gas containing a halogen to remove said peeling layers, whereby said first and second semiconductor integrated circuits are peeled from their respective support substrates.