Rinse water recycling in CMP apparatus
AssigneeIntegrated Process Equipment Corp.
InventorsJohn A. Adams, Gerald A. Krulik, C. Randall Harwood
Life of this patent
Estimating the term…
Abstract
Recycled slurry is continuously blended with the slurry in use to provide a consistent polishing rate while consuming or discarding a small fraction of the slurry flowing continuously across the polishing pad. The slurry is recovered in a catch ring and fed to a recycle loop to blend the recovered slurry with fresh slurry, rejuvenating chemicals, or water; test the blend; filter the blend; and return the blend to the polishing pad. The volume returned to the pad slightly exceeds the volume recovered, causing the catch ring to overflow. Rinse water is recycled in the same fashion to keep the polishing pad wet between polishing cycles.
Claims3
A method for recycling rinse water in a CMP apparatus, the rinse water comprising substantially less than 1% abrasive solids by weight, in which the rinse water is applied to a polishing pad, said method comprising the steps of:
- at least partially surrounding the pad with a catch ring to collect the rinse water that flows off the pad;
- withdrawing rinse water from the ring;
- and
- returning the rinse water to the pad.
Dependencies are inferred from the claim text.