Electrochemical synthesis of quasi-periodic quantum dot and nanostructure arrays
AssigneeUniversity of Notre Dame du Lac
InventorsAlbert E. Miller, Supriyo Bandyopadhyay
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Abstract
A method of fabricating two-dimensional regimented and quasi periodic arrays of metallic and semiconductor nanostructures (quantum dots) with diameters of .about.100 .ANG.(10 nm) includes the steps of polishing and anodizing a substrate to form a regimented quasi-periodic array of nanopits. The array forms a template for metallic or semiconductor material. The desired material is deposited in the nanopits by immersing the substrate in an appropriate solution and using the substrate as one cathode and inserting a second cathode in the solution.
Claims31
A method of fabricating nanostructures, comprising the steps of:
- electropolishing a single crystal substrate so as to form pits in said substrate;
- anodizing said substrate to form an oxide layer having a plurality of pores thereon;
- and
- depositing material within said pores.
A method of fabricating nanostructures, comprising the steps of:
- electropolishing a substrate so as to form pits in said substrate;
- anodizing said substrate to form an oxide layer having a plurality of pores thereon;
- depositing material within said pores;
- and
- removing said substrate.
A method of fabricating nanostructures, comprising the steps of:
- selecting a semiconducting substrate;
- depositing a layer of metal on said substrate;
- electropolishing said layer of metal so as to form pits therein;
- anodizing said metal layer so as to convert substantially all of said metal layer to an oxide layer containing pores;
- and
- depositing material in said pores.
A nanostructure, comprising:
- an aluminum layer;
- a layer of aluminum oxide on said aluminum layer, said layer of aluminum oxide having at least one pore therein;
- nickel deposited in said at least one pore;
- and
- copper deposited on said layer of aluminum oxide and said nickel.
A method of fabricating nanostructures, comprising the steps of:
- electropolishing a substrate so as to form pits in said substrate;
- anodizing said substrate to form an oxide layer having a plurality of pores thereon;
- and
- depositing lead within said pores.
A method of fabricating nanostructures, comprising the steps of:
- electropolishing a substrate so as to form pits in said substrate;
- anodizing said substrate to form an oxide layer having a plurality of pores thereon;
- and
- depositing semiconductor material within said pores.
A method of fabricating nanostructures, comprising the steps of:
- electropolishing a substrate so as to form pits in said substrate;
- anodizing said substrate to form an oxide layer having a plurality of pores thereon;
- depositing material within said pores by immersing said substrate and said oxide film in an acidic bath, utilizing said substrate as a first electrode, immersing a second electrode in said bath, and passing current through said electrodes;
- and
- immersing said anodized substrate in a boiling bath of a salt containing cation of said material.
A method of fabricating a quasi periodic array of compound semiconductor quantum dots, comprising the steps of:
- electropolishing a substrate;
- anodizing the substrate at constant current density in an acidic electrolyte;
- and
- immersing the substrate in a bath containing a cation of the compound semiconductor.
A method of producing a quantum dot array comprising the steps of:
- electropolishing an aluminum substrate;
- anodizing the substrate in an acid bath at constant currant density;
- and
- immersing the substrate in a bath containing lead acetate.
A method of producing a quantum dot array of metallic or semiconductor material comprising the steps of:
- choosing a substrate;
- depositing an aluminum film on the substrate;
- electropolishing the film;
- anodizing the film completely to convert it to a porous alumina film;
- and
- electrodepositing a metallic or semiconductor material into the pores.
A method of making a structure comprising the steps of:
- electropolishing aluminum;
- anodizing the aluminum in an acid bath at a constant current density to produce a porous alumina film;
- electrodepositing nickel within the pores;
- depositing a copper film on the nickel;
- and
- attaching leads to the copper film.
Dependencies are inferred from the claim text.