Activating catalytic solution for electroless plating
AssigneeMurata Manufacturing Co., Ltd.
InventorsOsamu Kanoh, Yasushi Yoshida, Atsuo Senda, deceased
Life of this patent
Estimating the term…
Loading patent…
AssigneeMurata Manufacturing Co., Ltd.
InventorsOsamu Kanoh, Yasushi Yoshida, Atsuo Senda, deceased
Estimating the term…
Disclosed is an activating catalytic solution for electroless plating which makes possible carrying out successive processes efficiently, without using organic solvent, involving preparation of activating catalytic solution for forming substrate film, formation of a photo-sensitive film by providing the activating catalytic solution, creation of activating catalyst by exposure of specific areas of the photo-sensitive film to light, development by rinsing unexposed portions of the photo-sensitive film, and immersion of the substrate in an electroless plating bath. The activating catalyst can be created with high sensitivity to light at small energy of radiation. The activating catalytic solution preferably contains zinc oxalate, a copper salt, palladium salt such as palladium chloride, and an alkaline solution such as an ammonia water. The activating catalytic solution is used for forming a photo-sensitive film on a substrate to be subjected to electroless plating.
A activating catalytic solution for hydrophilic electroless plating comprising an alkaline solution of zinc salt, copper salt and palladium salt wherein at least one of the zinc and copper salts is oxalate.
Dependencies are inferred from the claim text.