Apparatus for simultaneous X-ray diffraction and X-ray fluorescence measurements
AssigneeU.S. Philips Corporation
InventorsPieter K. De Bokx, Paul Van Der Sluis, Bruno A. R. Vrebos
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AssigneeU.S. Philips Corporation
InventorsPieter K. De Bokx, Paul Van Der Sluis, Bruno A. R. Vrebos
Estimating the term…
In the case of simultaneous diffraction and fluorescence measurements in an apparatus for X-ray analysis comprising only one X-ray tube, a problem is encountered in that due to the presence of the collimators required for the fluorescence measurements only a very low X-ray power reaches the detectors, so that very long measuring times and/or an unfavorable signal-to-noise ratio occur. As a result, the detection limit for given measurements (low concentration of an element and/or light elements to be detected) becomes too high or the use of a (large and expensive) high-power X-ray tube is required. The invention utilizes a line focus tube 10 in combination with a single-slit collimator 14 for irradiating the sample 2, the fluorescence section 40 being constructed so as to have a plane or cylindrical analysis crystal 42 in combination with a location-sensitive detector 44. The diffraction measurements are performed by means of a conventional diffraction arrangement 24.
An apparatus for the examination of materials by simultaneous X-ray diffraction and X-ray fluorescence, comprising:
Dependencies are inferred from the claim text.