Method and apparatus for machining semiconductor material
AssigneeWacker Siltronic Gesellschaft fur Halbleitermaterialien AG
InventorsHolger Lundt, Karl Kobler, Hanifi Malcok
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Abstract
A method and an apparatus are for machining semiconductor material with a inding tool while feeding a liquid cleaning agent to the working surface of the grinding tool, has the cleaning agent being exposed to sound waves having a specific frequency and having a specific intensity. In one embodiment of the method, the cleaning agent is exposed to sound waves in at least one nozzle and then the cleaning agent is directed against the working surface of the grinding tool. In another embodiment, the cleaning agent is guided through at least two cleaning agent jets against the working surface of the grinding tool, which cleaning agent jets differ from each other in that they are exposed to sound waves of different frequencies.
Claims8
A method for machining semiconductor material with a grinding tool while feeding a liquid cleaning agent to a working surface of the grinding tool, comprising
- directing the liquid cleaning agent in the form of at least two cleaning agent jets against the working surface of the grinding tool;
- exposing each of said at least two cleaning agent jets to sound waves of a different frequency;
- and
- whereby the liquid cleaning agent is exposed to sound waves having a specific frequency and a specific intensity.
An apparatus for machining semiconductor material with a grinding tool while feeding a cleaning agent to a working surface of the grinding tool, comprising
- at least two nozzles which are directed toward the working surface of the grinding tool;
- at least two sound generating component means with one sound generating component means built into each nozzle which generates sound waves of a specific frequency and intensity;
- at least two oscillators with one oscillator for each sound generating component means, and each oscillator excites the sound generating component to vibrate and to generate sound waves;
- and
- means for feeding said cleaning agent to and through said at least two nozzles for exposing the cleaning agent to sound waves of a different frequency.
Dependencies are inferred from the claim text.