Substrate holding apparatus

An exposure apparatus that forms patterns of a mask in plural shot areas on a substrate by an operating cycle involving repeated exposure and displacement of said substrate, and that includes a substrate holding apparatus comprising:

• a) a substrate holding unit having plural protruding portions to support said substrate thereon for exposure and displacement;
• b) a temperature regulating unit that absorbs heat accumulated in said substrate holding unit by contact with said substrate holding unit;
• c) a temperature control unit that controls temperature of said temperature regulating unit by removing heat from said temperature regulating unit during said operating cycle;
• and
• d) a vacuum suction apparatus for holding said temperature regulating unit in contact with said substrate holding unit by vacuum suction.

An exposure apparatus that forms patterns of a mask in plural shot areas on a substrate by an operating cycle involving repeated exposure and displacement of said substrate, and that includes a substrate holding apparatus comprising:

• a) plate-shaped substrate holder having one side provided with plural protruding portions to support said substrate thereon for exposure and displacement, and an opposite side;
• b) a temperature regulator having a surface adapted to contact said opposite side of substrate holder to absorb heat from said substrate holder, said temperature regulator having an internal path for passing a heat conducting fluid therethrough and having means for applying vacuum suction to said opposite side of said substrate holder to hold said surface of said temperature regulator in contact with said opposite side of said substrate holder;
• and
• c) a temperature controller that controls temperature of said fluid during said operating cycle such that said fluid removes heat from said temperature regulator.