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US 5,733,714 AGranted
Antireflective coating for photoresist compositions
AssigneeClariant Finance (BVI) Limited
InventorsIain McCulloch, Ralph R. Dammel, Anthony J. Corso, Shuji Ding, Dana L. Durham, Ping-Hung Lu, Ming Kang, Dinesh N. Khanna
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Abstract
The present invention relates to a novel antireflective coating solution and a process for its use in photolithography. The antireflective coating solution comprises a novel polymer and an organic solvent or a mixture of organic solvents, where the novel polymer comprises a unit containing a dye that absorbs from about 180 nm to about 450 nm and a unit containing a crosslinking group.
Claims28
An antireflecting coating composition for use in photolithography, comprising
- a) a polymer comprising at least one dye unit having a structure, ##STR10## where R.sub.1 -R.sub.3 are independently H, (C.sub.1 -C.sub.10) alkyl or (C.sub.1 -C.sub.10) alkoxy,
- X.sub.1 is C.dbd.O, OCO, CONH, O, aryl, (C.sub.1 -C.sub.10) alkyl, cyclohexyl, pyridine or pyrollidone,
- X.sub.2 is S, S(C.sub.1 -C.sub.10) alkyl, O, O(C.sub.1 -C.sub.10) alkyl, NH, N(C.sub.1 -C.sub.10) alkyl, alkyl, or hydroxyalkyl(C.sub.1 -C.sub.10),
- n=0-2,
- A is an electronwithdrawing group,
- R.sub.4 is H, (C.sub.1 -C.sub.10) alkyl, (C.sub.1 -C.sub.10) alkoxy, nitro, halide, cyano, aryl, alkylaryl, alkenyl, dicyanovinyl or SO.sub.2 CF.sub.3, COOZ, SO.sub.3 Z, COZ, OZ, NZ.sub.2, SZ, SO.sub.2 Z, NHCOZ, or SO.sub.2 NZ.sub.2, where Z is H or (C.sub.1 -C.sub.10) alkyl,
- Y is a conjugated moiety N.dbd.N, CW.dbd.CW, CW.dbd.N, or N.dbd.CW, where W is H, (C.sub.1 -C.sub.10) alkyl or (C.sub.1 -C.sub.10) alkoxy,
- m=1-5, and
- at least one unit capable of crosslinking the polymer having a structure ##STR11## where G contains a crosslinking functionality and R.sub.1 to R.sub.3 are independently H, (C.sub.1 -C.sub.10) alkyl or (C.sub.1 -C.sub.10) alkoxy, and
- b) a suitable solvent.
7 more elements
Dependencies are inferred from the claim text.