Process for producing a purified aqueous hydrogen peroxide solution
AssigneeMitsubishi Gas Chemical Company, Inc.
InventorsYoshitsugu Minamikawa, Seishi Murakami, Masamichi Hattori
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Abstract
A process for producing a purified aqueous hydrogen peroxide solution comprising bringing an aqueous hydrogen peroxide solution containing impurities into contact with an anion exchange resin in the fluoride form is disclosed. According to the process, impurities in the aqueous hydrogen peroxide solution, particularly impurities containing silicon, such as silicates and silicic acid, can efficiently be removed, and a purified aqueous hydrogen peroxide solution having a high purity can be obtained.
Claims9
A process for producing a purified aqueous hydrogen peroxide solution comprising contacting an aqueous hydrogen peroxide solution containing impurities including silicon, and containing 15% or more by weight of hydrogen peroxide, firstly with a strongly acidic cation exchange resin having a sulfonic acid group, secondly, with an anion exchange resin in a fluoride form, and thirdly with an anion exchange resin in a bicarbonate form.
A process for producing a purified aqueous hydrogen peroxide solution comprising adding an acid having an acid dissociation constant, pKa, of 5 or less in water to an aqueous hydrogen peroxide solution containing impurities including silicon, and containing 15% or more by weight of hydrogen peroxide, the acid being added in an amount so that the concentration of the acid is 0.005 to 5 meq/liter and contacting the resultant aqueous solution with an anion exchange resin in the fluoride form.
Dependencies are inferred from the claim text.