Method for conditioning halogenated polymeric materials and structures fabricated therewith
AssigneeInternationl Business Machines Corporation
InventorsHarry Randall Bickford, Elizabeth Foster, Martin Goldberg, Voya Rista Markovich, Linda Matthew, Stephen Leo Tisdale, Alfred Viehbeck
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Abstract
A halogenated polymeric material is exposed to a reducing agent and/or an electrolyte and applied voltage to render exposed portions capable of being metallized and of being etched. The exposed portions can also be doped to thereby induce electrical conductivity therein. Also, new structures containing a free standing halogenated polymeric-containing layer and electrical conductive pattern thereon are provided.
Claims29
A method of etching a halogenated polymeric-containing substrate which comprises:
- exposing at least portions of said substrate to a reducing agent;
- and
- then exposing said substrate to a solvent to thereby dissolve portions of the said substrate exposed to said reducing agent.
A method of etching a halogenated polymeric-containing substrate which comprises:
- obtaining an electrode having disposed thereon a halogenated polymeric-containing surface;
- contacting said halogenated polymeric-containing surface disposed on said electrode with an electrolyte solution;
- supplying a voltage between said electrode and a cathode to reduce at least portions of said polymeric material;
- and
- then exposing said substrate to a solvent to thereby dissolve reduced portions of said substrate.
Dependencies are inferred from the claim text.