Reactant gas ejector head and thin-film vapor deposition apparatus
AssigneeEbara Corporation
InventorsTakeshi Murakami, Noriyuki Takeuchi, Hiroyuki Shinozaki, Kiwamu Tsukamoto, Yukio Fukunaga, Akihisa Hongo
Life of this patent
Estimating the term…
Abstract
A reactant gas ejector head in a thin-film vapor deposition apparatus includes at least two reactant gas inlet passages for introducing reactant gases, a gas mixing chamber for mixing reactant gases introduced from the reactant gas inlet passages, and a nozzle disposed downstream of the gas mixing chamber for rectifying the mixed gases from the gas mixing chamber into a uniform flow and applying the uniform flow to a substrate.
Claims28
A reactant gas ejector head for use in providing a reactant gas flow toward a substrate to be arranged in a reaction chamber for depositing a thin film thereon, said head comprising:
- a plurality of gas mixing chambers distributed in a plane to extend substantially parallel to the substrate for mixing reactant gases;
- each said gas mixing chamber having connected thereto respective at least two reactant gas inlet passages capable of introducing different types of reactant gases to said each gas mixing chamber individually;
- and
- each said gas mixing chamber having connected thereto a respective ejection nozzle for ejecting reactant gases mixed in said each gas mixing chamber onto the substrate.
A thin-film vapor deposition apparatus comprising:
- a reaction chamber;
- a substrate holder for supporting a substrate in said reaction chamber;
- and
- a reaction gas ejector head for providing a reactant gas flow toward the substrate supported by said substrate holder, said reaction gas ejector head comprising:
- a plurality of gas mixing chambers distributed in a plane extending substantially parallel to a plane of the substrate when supported by said substrate holder for mixing reactant gases;
- each said gas mixing chamber having connected thereto respective at least two reactant gas inlet passages capable of introducing different types of reactant gases to said each gas mixing chamber individually;
- and
- each said gas mixing chamber having connected thereto a respective ejection nozzle for ejecting reactant gases mixed in said each gas mixing chamber onto the substrate.
Dependencies are inferred from the claim text.