Hologram and method of fabricating

A method of fabricating a hologram element, comprising the steps of:

• preparing an optically transparent base plate having first and second opposite surfaces;
• forming a film having a diffraction grating on the first surface of the base plate using a light exposure process;
• and
• performing a dipping process to provide a film on the second surface of the base plate for preventing reflection of light after the film having the diffraction grating is formed,
• wherein the film includes SiO.sub.2 particles having diameters of 10-150 nm.

A method of fabricating a hologram display, comprising the steps of:

• preparing a cover plate;
• forming a hologram element on the cover plate, the hologram element having a side subjected to incident light;
• preparing a solution containing SiO.sub.2 particles;
• and
• dipping the side of the hologram element in the solution to provide an antireflection film including SiO.sub.2 particles at the side of the hologram element after the hologram element is formed.

A method of fabricating a hologram display, comprising the steps of:

• preparing a cover plate;
• forming a hologram element on the cover plate using a light exposure process, the hologram element having a first side that is subjected to incident light;
• and
• providing a film on the first-side of the hologram element using a dipping process after the hologram element is formed, the film being provided to prevent reflection of light and the film including SiO.sub.2 particles having diameters of 10-150 nm,
• wherein the hologram element comprises a flexible resin film and a second film having a diffraction grating, the second film being provided on the flexible resin film.

A method of fabricating a hologram element, comprising the steps of:

• preparing an optically transparent base plate having first and second opposite surfaces;
• forming a film having a diffraction grating on the first surface of the base plate;
• preparing an optically transparent member having first and second opposite surfaces, wherein the first surface of the member faces the diffraction grating film;
• preparing a solution containing SiO.sub.2 particles;
• and
• dipping the second surface of the base plate in the solution to provide an antireflection film including SiO.sub.2 particles on the second surface of the base plate after the film having the diffraction grating is formed.

A method of fabricating a hologram element, comprising the steps of:

• preparing an optically transparent base plate having first and second opposite surfaces;
• forming a film having a diffraction grating on the first surface of the base plate using a light exposure process;
• preparing an optically transparent member having first and second opposite surfaces, the first surface of the member facing the diffraction grating film;
• and
• performing a dipping process to provide a film on the second surface of the base plate for preventing reflection of light after the film having the diffraction grating is formed,
• wherein the film includes SiO.sub.2 particles having diameters of 10-50 nm, and wherein at least one of the base plate and the optically transparent member comprises a flexible resin film.

A method of fabricating a hologram element, comprising the steps of:

• preparing an optically transparent base plate having first and second opposite surfaces;
• forming a film having a diffraction grating on the first surface of the base plate using a light exposure process;
• and
• performing a dipping process to provide a film on the second surface of the base plate for preventing reflection of light after the film having the diffraction grating is formed,
• wherein the film includes MgF.sub.2 particles.

A method of fabricating a hologram element, comprising the steps of:

• preparing an optically transparent base plate having first and second opposite surfaces, wherein the base plate comprises a flexible resin film;
• forming a film having a diffraction grating on the first surface of the base plate using a light exposure process;
• and
• performing a dipping process to provide a film on the second surface of the base plate for preventing reflection of light after the film having the diffraction grating is formed,
• wherein the film includes MgF.sub.2 particles.

A method of fabricating a hologram display, comprising the steps of:

• preparing a cover plate;
• forming a hologram element on the cover plate using a light exposure process, the hologram element having a first side that is subjected to incident light;
• and
• providing a film on the first side of the hologram element using a dipping process after the hologram element is formed, the film being provided to prevent reflection of light and the film including MgF.sub.2 particles,
• wherein the hologram element comprises a flexible resin film and a second film having a diffraction grating, the second film being provided on the flexible resin film.

A method of fabricating a hologram element, comprising the steps of:

• preparing an optically transparent base plate having first and second opposite surfaces;
• forming a film having a diffraction grating on the first surface of the base plate using a light exposure process;
• preparing an optically transparent member having first and second opposite surfaces, the first surface of the member facing the diffraction grating film;
• and
• performing a dipping process to provide a film on the second surface of the base plate for preventing reflection of light after the film having the diffraction grating is formed,
• wherein the film includes MgF.sub.2 particles, and at least one of the base plate and the optically transparent member comprises a flexible resin film.

A hologram device comprising:

• a hologram member including a film and a hologram element, the film being fabricated from at least a flexible resin, the hologram element being positioned on the film and having a diffraction grating;
• first and second cover plates being positioned on opposing sides of the hologram member, the hologram member and the first and second cover plates being bonded together by a welding process using an ultrasonic wave, at least one of the first and second cover plates having a light incident surface;
• and
• an anti-reflection layer positioned on the light incidence surface of one of the first and second cover plates, the anti-scattering layer including at least one of SiO.sub.2 particles having diameters ranging from 10-150 nm and MgF.sub.2 particles.

A method of fabricating a hologram device, comprising the steps of:

• forming a hologram element on a film by applying light to the film, the film being fabricated from at least a flexible resin, the hologram element having a diffraction pattern;
• forming an anti-reflection layer on at least one surface of a first cover plate using a dipping process, the anti-scattering layer including at least one of SiO.sub.2 particles having diameters ranging from 10-150 nm and MgF.sub.2 particles;
• placing the hologram element between the first cover plate and a second cover plate;
• and
• bonding the hologram element together with the first and second cover plates by a welding process using an ultrasonic wave.

A method of fabricating a hologram element, comprising the steps of:

• preparing an optically transparent base plate having first and second opposite surfaces;
• forming a film having a diffraction grating on the first surface of the base plate;
• preparing a solution containing particles;
• and
• dipping the second surface of the base plate in the solution to provide an antireflection film including particles on the second surface of the base plate after the film having the diffraction grating is formed.

A method of fabricating a hologram element, comprising the steps of:

• preparing an optically transparent base plate having first and second opposite surfaces;
• forming a film having a diffraction grating on the first surface of the base plate using a light exposure process;
• and
• performing a dipping process to provide a film on the second surface of the base plate for preventing reflection of light after the film having the diffraction grating is formed,
• wherein the film includes particles having diameters of 10-150 nm.

A method of fabricating a hologram display, comprising the steps of:

• preparing a cover plate;
• forming a hologram element on the cover plate, the hologram element having a side subjected to incident light;
• preparing a solution containing particles;
• and
• dipping the side of the hologram element in the solution to provide an antireflection film including particles at the side of the hologram element after the hologram element is formed.

A method of fabricating a hologram display, comprising the steps of:

• preparing a cover plate;
• forming a hologram element on the cover plate using a light exposure process, the hologram element having a first side that is subjected to incident light;
• and
• providing a film on the first side of the hologram element using a dipping process after the hologram element is formed, the film being provided to prevent reflection of light and the film including particles having diameters of 10-150 nm,
• wherein the hologram element comprises a flexible resin film and a second film having a diffraction grating, the second film being provided on the flexible resin film.

A method of fabricating a hologram element, comprising the steps of:

• preparing an optically transparent base plate having first and second opposite surfaces;
• forming a film having a diffraction grating on the first surface of the base plate;
• preparing an optically transparent member having first and second opposite surfaces, wherein the first surface of the member faces the diffraction grating film;
• preparing a solution containing particles;
• and
• dipping the second surface of the base plate in the solution to provide an antireflection film including particles on the second surface of the base plate after the film having the diffraction grating is formed.

A method of fabricating a hologram element, comprising the steps of:

• preparing an optically transparent base plate having first and second opposite surfaces;
• forming a film having a diffraction grating on the first surface of the base plate using a light exposure process;
• preparing an optically transparent member having first and second opposite surfaces, the first surface of the member facing the diffraction grating film;
• and
• performing a dipping process to provide a film on the second surface of the base plate for preventing reflection of light after the film having the diffraction grating is formed,
• wherein the film includes particles having diameters of 10-150 nm, and wherein at least one of the base plate and the optically transparent member comprises a flexible resin film.

A hologram device comprising:

• a hologram member including a film and a hologram element, the film being fabricated from at least a flexible resin, the hologram element being positioned on the film and having a diffraction grating;
• first and second cover plates being positioned on opposing sides of the hologram member, the hologram member and the first and second cover plates being bonded together by a welding process using an ultrasonic wave, at least one of the first and second cover plates having a light incident surface;
• and
• an anti-reflection layer positioned on the light incidence surface of one of the first and second cover plates, the anti-scattering layer including particles.

A method of fabricating a hologram device, comprising the steps of:

• forming a hologram element on a film by applying light to the film, the film being fabricated from at least a flexible resin, the hologram element having a diffraction pattern;
• forming an anti-reflection layer on at least one surface of a first cover plate using a dipping process, the anti-scattering layer including particles;
• placing the hologram element between the first cover plate and a second cover plate;
• and
• bonding the hologram element together with the first and second cover plates by a welding process using an ultrasonic wave.