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US 5,726,066 AGranted
Method for manufacturing an infrared sensor array
AssigneeLG Electronics Inc.
InventorJun Rim Choi
Life of this patent
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Abstract
An infrared sensor array and manufacturing method thereof is disclosed including a substrate; a supporter having a space portion for adiabatic structure between the substrate and supporter; and a plurality of infrared sensors arranged with a predetermined distance each other on the supporter above the space portion.
Claims10
A method for manufacturing an infrared sensor array comprising the steps of:
- forming a sacrificial layer on a predetermined region of a substrate;
- forming a supporter of polycrystalline silicon to cover the sacrificial layer and the substrate on both sides of the sacrificial layer;
- forming numbers of infrared sensors arranged at a predetermined distance from each other on the supporter above the sacrificial layer;
- forming etching windows on the upper and lower and right and left side of said infrared sensors;
- and
- removing the sacrificial layer to form a space between the supporter and the substrate.
3 more elements
Dependencies are inferred from the claim text.