US 5,725,788 A · Apparatus and method for patterning a surface

Abstract

An apparatus (95) and method for patterning a surface of an article (30), the apparatus (95) including a large-area stamp (50) for forming a self-assembled monolayer (36) (SAM) of a molecular species (38) on the surface (34) of a layer (32) of resist material, which is formed on the surface of the article (30). The large-area stamp (50) includes a layer (52) of an elastomer and has, embedded within it, mechanical structures (68, 80) which stiffen the large-area stamp (50) and deform it to control the stamped patterns. The method includes the steps of: forming a layer (32) of resist material is on the surface of the article (30), utilizing the large-area stamp (50) to form the SAM (36) on the surface (34) of the layer (32) of resist material, etching the layer (32) of resist material, and thereafter etching or plating the surface of the article (30).

Claims40

Dependent claims

A method for patterning a surface of an article comprising the steps of:

providing a layer of flexible material having first and second opposed surfaces;
forming a relief in the first opposed surface of the layer of flexible material, the relief having a plurality of contacting surfaces defining a first pattern, the relief including an indentation defining a second pattern;
wetting the plurality of contacting surfaces with a solution containing a self-assembled monolayer-forming molecular species thereby providing a wetted plurality of contacting surfaces;
forming on the surface of the article a layer of resist material having an outer surface to which the self-assembled monolayer-forming molecular species binds;
thereafter contacting the wetted plurality of contacting surfaces with the outer surface of the layer of resist material;
thereafter removing the plurality of contacting surfaces thereby forming a self-assembled monolayer of the self-assembled monolayer-forming molecular species on the outer surface of the layer of resist material and thereby providing an exposed area of the outer surface of the resist material having the second pattern;
and
etching the exposed area of the outer surface of the resist material with an etchant which is inert with respect to the self-assembled monolayer thereby providing an exposed area of the surface of the article having the second pattern.

5 more elements

A method for applying a self-assembled monolayer of a molecular species to an outer surface of a layer of resist material, the method including the steps of:

providing a layer of flexible material having first and second opposed surfaces;
forming a relief in the first opposed surface of the layer of flexible material so that the relief includes a plurality of contacting surfaces defining a first pattern and an indentation defining a second pattern thereby forming a large-area stamp;
wetting the plurality of contacting surfaces of the large-area stamp with a solution containing a self-assembled monolayer-forming molecular species;
aligning the large-area stamp with the outer surface of the layer of resist material;
contacting the plurality of contacting surfaces of the large-area stamp with the outer surface of the layer of resist material;
and
removing the large-area stamp from the outer surface of the layer of resist material thereby forming a self-assembled monolayer of the molecular species on the outer surface of the layer of resist material, the self-assembled monolayer having the first pattern.

4 more elements

Dependencies are inferred from the claim text.

Apparatus and method for patterning a surface

Life of this patent

Apparatus and method for patterning a surface

Life of this patent

Abstract

Claims40