# US 5,710,444 A · Insulated gate bipolar transistor having a coupling element

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- Number: US 5,710,444 A
- Document ID: US5710444A
- Status: Granted
- Kind: A
- Application number: 08/448,505
- Filed: 1995-06-08
- Granted: 1998-01-20
- Earliest claimed: 1992-12-28
- Assignees: Daimler-Benz Aktiengesellschaft
- Inventors: Horst Neubrand; Jacek Korec; Dieter Silber
- Web page: https://patentgrep.com/patent/US5710444A

## CPC

- H10D 62/393: {Body regions of DMOS transistors or IGBTs (cell layout of DMOS H10D62/127)}
- H10D 12/421: {on insulating layers or insulating substrates, e.g. thin-film IGBTs}
- H10D: INORGANIC ELECTRIC SEMICONDUCTOR DEVICES

## Abstract

The invention concerns a field-effect controlled semiconductor component with at least four regions of alternating opposite performance types: an anode-side emitter region, a first and a second base region connected to the emitter region, and a cathode-side emitter region; the cathode-side emitter region and the first base region from the source and drain of an MOS field effect transistor. The component also comprises an anode contact, a contact at the cathode-side emitter region and a control electrode contact of the MOS field effect transistor. The invention lies in the fact that a p+ region (36) which is adjacent to the cathode-side base region, separate, and accomodated in the anode-side n- base region (20), is connected via a separate component as a coupling element (80) with non-linear current/voltage characteristics to the cathode contact, the said region (36) being directly surrounded by the anode-side base region (20). When the field effect transistor is switched off the electrical potential in the area surrounding the supplementary p+ region (36) will exceed the threshold voltage of the coupling element, so that the supplementary p+ region (36) acts as a current sink by which the hole current can drain off against low resistance. A parasitic thyristor function is thus avoided.

## Claims

### Claim 1

A field-effect-controlled semiconductor component (IGBT), comprising:
a semiconductor body having at least four regions of alternating opposite conductivity types and forming respective p-n junctions between adjoining ones of said four regions, said four regions including an anode-end emitter region, said four regions adjoining first and second base regions and a cathode-end emitter region, wherein the cathode-end emitter region and the first base region form a source and a drain of an MOS field-effect transistor having a channel region formed adjacent the second base region;
an anode contact for the anode end emitter region, a cathode contact for the cathode-end emitter region and a control electrode contact for the MOS field-effect transistor and disposed on an insulating layer formed on a top surface of the semiconductor body and above the source, drain and channel regions;
an additional p-n junction realized by a separately disposed p.sup.+ -area which lies adjacent to the second base region and which is placed into the first region, which is an n-type conductivity region; and wherein
the p.sup.+ -area is connected only to the cathode contact via a coupling element having a nonlinear current/voltage characteristic, with the coupling element being separated from the structure within the semiconductor body of the semiconductor component; whereby when the IGBT is switched off, a hole current flows from the anode contact to the cathode contact not only via the second base region which is a p-region, but also via the p.sup.+ -area and via the coupling element in order to prevent an ignition of a parasitic thyristor structure.

### Claim 2 (depends on 1)

A field-effect-controlled semiconductor element according to claim 1, wherein the coupling element is a Zener diode polarized in reverse direction.

### Claim 3 (depends on 1)

A field-effect-controlled semiconductor element according to claim 1, wherein the coupling element is integrated as a chain of diodes into a layer of polycrystalline silicon and is polarized in forward direction.

### Claim 4 (depends on 1)

A field-effect-controlled semiconductor component according to claim 1, wherein the cathode-end emitter region is partially covered by a highly doped p-layer.

### Claim 5 (depends on 1)

A field-effect-controlled semiconductor component according to claim 1, at a face facing away from a top side of the semiconductor body, the first base region rests entirely on an insulating layer.