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US 5,709,753 AGranted
Parylene deposition apparatus including a heated and cooled dimer crucible
AssigneeSpecialty Coating Sysetms, Inc.
InventorsRoger A. Olson, William F. Beach, John Wary
Life of this patent
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Abstract
Chemical vapor deposition apparatus is provided for the quick and efficient deposition of Parylene AF4 onto silicon wafers in the production of semiconductor chips. The apparatus includes a heated and cooled dimer receptacle for fast and efficient vaporization of parylene dimer material.
Claims20
A deposition apparatus comprising:
- a vaporization chamber;
- a thermally conductive heat transfer receptacle disposed in said vaporization chamber;
- a first heater capable of heating said heat transfer receptacle to a predetermined temperature;
- a second heater capable of heating inner walls of said vaporization chamber;
- a pyrolysis chamber coupled to said vaporization chamber;
- a deposition chamber coupled to said pyrolysis chamber;
- a platen disposed within the deposition chamber;
- and
- a device for heating and cooling the platen.
6 more elements
A vaporization chamber, comprising:
- a housing;
- a thermally conductive heat transfer receptacle disposed in said housing;
- a first heater capable of heating said heat transfer receptacle to a predetermined temperature;
- a second heater capable of heating inner walls of said housing;
- a deposition chamber in fluid communication with the housing;
- a platen disposed within the deposition chamber;
- and
- a device for heating and cooling the platen.
5 more elements
Dependencies are inferred from the claim text.