# US 5,707,500 A · Vacuum processing equipment, film coating equipment and deposition method > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 5,707,500 A - Document ID: US5707500A - Status: Granted - Kind: A - Application number: 08/467,964 - Filed: 1995-06-06 - Granted: 1998-01-13 - Earliest claimed: 1991-08-12 - Assignees: Hitachi, Ltd. - Inventors: Hideaki Shimamura; Yuji Yoneoka; Shigeru Kobayashi; Satosi Kisimoto; Sunao Matsubara; Hiroyuki Shida; Yukio Tanigaki; Masashi Yamamoto; Susumu Tsuzuku; Eisuke Nishitani; Tokio Kato; Akira Okamoto - Web page: https://patentgrep.com/patent/US5707500A ## CPC - H10P 72/0434: {mainly by convection} - C23C 14/541: {Heating or cooling of the substrates} - H10P 72/0431: {Apparatus for thermal treatment} - H10P: GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10 - C23C: COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion B21C23/22; covering with metal by connecting pre-existing layers to articles, see the relevant places, e.g. B21D39/00, B23K; metallising of glass C03C; metallising mortars, concrete, artificial stone, ceramics or natural stone C04B41/00; enamelling of, or applying a vitreous layer to, metals C23D; treating metal surfaces or coating of metals by electrolysis or electrophoresis C25D; single-crystal film growth C30B; by metallising textiles D06M11/83; decorating textiles by locally metallising D06Q1/04) ## Abstract The present invention relates to vacuum processing equipment for processing a wafer in a vacuum, and film coating or forming equipment and method for forming a film on a wafer wherein radiation measurement and temperature control of the wafer is carried out by using an infrared radiation thermometer. Based upon the radiation measurement, heating and/or cooling of the wafer during processing is carried out. ## Claims ### Claim 1 A vacuum processing device for a substrate comprising: a plurality of vacuum units, at least one of the plurality of vacuum units enabling processing of the substrate therein; means for carrying the substrate to the vacuum units; a plurality of infrared radiation thermometers, each of the infrared radiation thermometers being provided for measuring a temperature of the substrate and for providing an output indicative thereof, at least one of the plurality of infrared radiation thermometers being disposed at a position with respect to the at least one of the plurality of vacuum units enabling processing of the substrate for measuring a temperature of the substrate during processing of the substrate and for providing an output indicative thereof, and at least one other of the plurality of infrared radiation thermometers being disposed at a different position from the position of the at least one of the infrared radiation thermometer for measuring a temperature of the substrate at the different position at least one of before and after processing of the substrate in the at least one of the plurality of vacuum units enabling processing of the substrate and for providing an output indicative thereof; and determination means for comparing the output provided by the at least one of the plurality of infrared radiation thermometers for measuring the temperature of the substrate during the processing of the substrate in the at least one of the plurality of vacuum units enabling processing of the substrate with the output provided by the at least one other of the plurality of infrared radiation thermometers for measuring the temperature of the substrate at the different position at least one before and after the processing of the substrate in the at least one of the plurality of vacuum units enabling processing of the substrate. ### Claim 2 (depends on 1) A vacuum processing device according to claim 1, further comprising means for providing an indication of the result of comparison by the determination means. ### Claim 3 (depends on 1) A vacuum processing device according to claim 1, wherein the at least one of the plurality of infrared thermometers is disposed in the at least one of the plurality of vacuum units enabling processing of the substrate. ### Claim 4 (depends on 1) A vacuum processing device according to claim 1, wherein the at least one other of the plurality of infrared radiation thermometers is disposed at the different position for measuring a temperature of the substrate both before and after processing of the substrate in the at least one of the plurality of vacuum units enabling processing of the substrate. ### Claim 5 (depends on 1) A vacuum processing device according to claim 1, wherein the plurality of vacuum units includes at least one carriage vacuum unit connected to the at least one of the plurality of vacuum units enabling processing, the at least one carriage unit having the means for carrying the substrate accommodated therein. ### Claim 6 (depends on 5) A vacuum processing device according to claim 5, wherein the at least one other of the plurality of infrared radiation thermometers disposed at the different position for measuring a temperature of the substrate at least one of before and after the processing of the substrate is disposed in the at least one carriage vacuum unit. ### Claim 7 (depends on 6) A vacuum processing device according to claim 6, wherein the at least one other of the plurality of infrared radiation thermometers measures a temperature of the substrate both before and after processing of the substrate in the at least one of the plurality of vacuum units enabling processing. ### Claim 8 (depends on 1) A vacuum processing device according to claim 1 further comprising a lamp for heating the substrate, and means for determining heating conditions of the lamp on the basis of an infrared emissivity of the substrate. ### Claim 9 A vacuum processing device according to claim further comprising means for depositing a film on the substrate.