# US 5,706,077 A · Scan type projection exposure apparatus and microdevice manufacturing method using the same > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 5,706,077 A - Document ID: US5706077A - Status: Granted - Kind: A - Application number: 08/423,110 - Filed: 1995-04-18 - Granted: 1998-01-06 - Earliest claimed: 1994-04-22 - Assignees: Canon Kabushiki Kaisha - Inventors: Yasuyuki Unno - Web page: https://patentgrep.com/patent/US5706077A ## CPC - G03F 7/70333: {Focus drilling, i.e. increase in depth of focus for exposure by modulating focus during exposure [FLEX]} - G03F 7/70241: {Optical aspects of refractive lens systems, i.e. comprising only refractive elements} - G03F 7/70358: {Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging} - G03F 7/70733: {Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask} - G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G) ## Abstract A scanning projection exposure apparatus includes an imaging system for imaging a pattern of an original, placed on an object plane, upon a substrate, and a scanning device for relatively scanning the original and the substrate relative to the imaging system, wherein the imaging system provides different imaging positions with respect to a direction of an optical axis, to plural zones on the object plane, which zones are juxtaposedly defined along a direction of scan. ## Claims ### Claim 1 A scanning projection exposure apparatus, comprising: imaging means for illuminating an original with illumination light and for projecting a pattern of the illuminated original onto a substrate through a projection optical system; and scanning means for relatively scanning the original and the substrate relative to said imaging means, in a direction perpendicular to an optical axis of said protection optical system, wherein the illumination light defines an illumination region upon the original, the pattern of the original being scanned moves through different locations within the illumination region, and said imaging means is arranged so that, for projection of the pattern of the original at the different locations within the illumination region, the pattern is imaged at different imaging positions, being different with respect to the direction of the optical axis of said projection optical system. ### Claim 2 (depends on 1) An apparatus according to claim 1, wherein said imaging means comprises an optical member for defining different optical path lengths for imaging light in relation to the different locations within the illumination region. ### Claim 3 (depends on 2) An apparatus according to claim 2, wherein said optical member is disposed between an object plane of the original and the projection optical system. ### Claim 4 (depends on 2) An apparatus according to claim 2, wherein said imaging means provides different imaging positions with respect to a direction of an optical axis, to two zones on an object plane of the original, which zones are juxtaposedly defined along the scanning direction, and said optical member comprises a rectangular solid member made of a dielectric material, said rectangular solid member being disposed in one of the paths for the imaging lights from the two zones, so as to define an optical path difference between these paths. ### Claim 5 (depends on 4) An apparatus according to claim 4, wherein said optical member is disposed between an object plane of the original and the projection optical system. ### Claim 6 (depends on 2) An apparatus according to claim 2, wherein said optical member comprises a wedge-shaped member made of a dielectric material and has a thickness changing along the scanning direction, and wherein said wedge-shaped member is disposed across the paths for the imaging light so as to define optical path differences to the paths. ### Claim 7 (depends on 6) An apparatus according to claim 6, wherein said wedge-shaped member is disposed between an object plane of the original and the projection optical system. ### Claim 8 (depends on 2) An apparatus according to claim 2, wherein said optical member comprises a step-shaped member made of a dielectric material and has a thickness changing along the scanning direction, and wherein said step-shaped member is disposed across the paths for the imaging light so as to define optical path differences to the paths. ### Claim 9 (depends on 8) An apparatus according to claim 8, wherein said step-shaped member is disposed between an object plane of the original and the projection optical system. ### Claim 10 (depends on 2) An apparatus according to claim 2, wherein said optical member comprises a distributed refractivity member made of a dielectric material and has a thickness changing along the scanning direction, and wherein said distributed refractivity member is disposed across the paths for the imaging light so as to define optical path differences to the paths. ### Claim 11 (depends on 10) An apparatus according to claim 10, wherein said distributed refractivity member is disposed between an object plane of the original and the projection optical system. ### Claim 12 (depends on 1, 2, 3, 4, 5, 6, 7, 8, 9, 10, 11) A device manufacturing method which comprises a step of printing a device pattern on a substrate by use of a scanning projection exposure apparatus as recited in any one of claims 1-11.