# US 5,705,935 A · Method of managing mapping data indicative of excellent/defective chips on semiconductor wafer

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- Number: US 5,705,935 A
- Document ID: US5705935A
- Status: Granted
- Kind: A
- Application number: 08/505,623
- Filed: 1995-07-21
- Granted: 1998-01-06
- Earliest claimed: 1994-07-22
- Assignees: NEC Corporation
- Inventors: Katsuhiro Nishimura
- Web page: https://patentgrep.com/patent/US5705935A

## CPC

- H10W 46/00: Marks applied to devices, e.g. for alignment or identification
- H10W 46/101: {characterised by the type of information, e.g. logos or symbols}
- H10W 46/501: {for use before dicing}
- H10W 46/507: {Located in dummy chips or in reference chips}
- H10W: GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10

## Abstract

A mapping data indicative of locations of excellent integrated circuits is printed on a label sheet, and the label sheet carrying the mapping data is bonded to a peripheral area of a semiconductor wafer so as to easily manage the mapping data.

## Claims

### Claim 1

A method of managing a mapping data indicative of locations of acceptable products and locations of defective products on a semiconductor wafer, comprising the steps of:
a) testing products fabricated in first sub-areas defined in a major surface of said semiconductor wafer so as to determine acceptable products and defective products;
b) writing first marks indicative of said first sub-areas of either acceptable or defective products and a second mark indicative of a reference for determining said first sub-areas on a label separated from said semiconductor wafer; and
c) fixing said label to a second sub-area on said major surface of said semiconductor wafer where on product is fabricated.

### Claim 2 (depends on 1)

The method as set forth in claim 1, in which said second mark is a line representing a periphery of said semiconductor wafer, and said first marks are dots formed inside of said line, a relative relation between said line and each of said dots being corresponding to a relative relation between said periphery of said semiconductor wafer and one of said first sub-areas assigned said either acceptable or defective product.

### Claim 3 (depends on 2)

The method as set forth in claim 2, in which said line and said dots reflects a light beam at a first intensity different from a second intensity of said light beam reflected on a surface of said label.

### Claim 4 (depends on 2)

The method as set forth in claim 2, in which said dots are marked in one of a plurality of colors, said plurality of colors being representing grades of said acceptable products, respectively.

### Claim 5 (depends on 1)

The method as set forth in claim 1, in which said label includes
an aluminum sheet having a first surface where said first marks and said second mark are written, and
an adhesive compound layer laminated on a second surface of said aluminum sheet different from said first surface.

### Claim 6 (depends on 5)

The method as set forth in claim 5, in which said adhesive compound layer is adhered onto said second sub-area.

### Claim 7 (depends on 1)

The method as set forth in claim 1, further comprising the steps of
d) reading said first marks and said second mark from said label,
e) determining said first sub-areas assigned said either acceptable or defective products, and
f) separating said first sub-areas assigned to said acceptable products from said first sub-areas assigned to said defective products.

### Claim 8 (depends on 7)

The method as set forth in claim 7, in which said second mark and said first marks are a line representing a periphery of said semiconductor wafer and dots formed inside of said line, respectively, arranged in such a manner that a relative relation between said line and each of said dots is corresponding to a relative relation between said periphery of said semiconductor wafer and one of said first sub-areas assigned said either acceptable or defective product,
said line and said dots reflecting a light beam at a first intensity different from a second intensity of said light beam reflected on a surface of said label, said step d) includes the sub-steps of
d-1) sweeping said label with said light beam so as to measure said first intensity and said second intensity,
d-2) discriminating said relative relation between said line and said each of said dots, and
d-3) determining said relation between said periphery and said first sub-areas corresponding to said dots.