# US 5,705,570 A · Ablatively photodecomposable compositions

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- Number: US 5,705,570 A
- Document ID: US5705570A
- Status: Granted
- Kind: A
- Application number: 08/476,760
- Filed: 1995-06-07
- Granted: 1998-01-06
- Earliest claimed: 1995-06-07
- Assignees: International Business Machines Corporation
- Inventors: Francis Charles Burns; William Weathers Fleming; Victor Yee-Way Lee; Randy William Snyder
- Web page: https://patentgrep.com/patent/US5705570A

## CPC

- G03F 7/202: {Masking pattern being obtained by thermal means, e.g. laser ablation}
- C07C 315/04: by reactions not involving the formation of sulfone or sulfoxide groups
- G03F 7/039: Macromolecular compounds which are photodegradable, e.g. positive electron resists (G03F7/075 takes precedence; macromolecular quinonediazides G03F7/023)
- G03F 7/2053: {using a laser (ablative removal B41C)}
- H05K 3/0082: {characterised by the exposure method of radiation-sensitive masks}
- H05K 3/184: {using masks}
- H10W 70/69: Insulating materials thereof
- H05K 3/0032: {of organic insulating material}
- H05K 2201/0112: Absorbing light, e.g. dielectric layer with carbon filler for laser processing
- Y10S 428/901: Printed circuit
- Y10S 430/106: Binder containing
- Y10S 430/111: Polymer of unsaturated acid or ester
- Y10T 428/12528: Semiconductor component
- Y10T 428/12569: Synthetic resin
- Y10T 428/31678: Of metal
- G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G)
- C07C: ACYCLIC OR CARBOCYCLIC COMPOUNDS
- H05K: PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H10W: GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- Y10S: TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10T: TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION

## Abstract

The present invention provides an ablatively photodecomposable polymer having a photoabsorber bound to the polymer (the "ablatively photodecomposable polymer") which does not phase separate, nor does it crystallize. The ablatively photodecomposable polymer provides even ablation, high resolution and in preferred embodiments, can withstand potassium permanganate etchant and ferric chloride etchant. The ablatively photodecomposable polymer is strippable, although it can remain on the substrate if desired. The ablatively photodecomposable polymer comprises a polymer to which a photoabsorber is bound, either covalently or ionically. The present invention is also directed to a process for forming a metal pattern on a substrate employing the ablatively photodecomposable polymer.

## Claims

### Claim 1

An ablatively photodecomposable polymer comprising: polymerized monomeric units of acrylate monomeric units and acrylic acid monomeric units; a photoabsorber bound to the acrylic acid monomeric units; wherein the photoabsorber is 7-(diethylamine)-4-methyl coumarin.

### Claim 2

An ablatively photodecomposable acrylate polymer comprising: polymerized units of acrylic acid; and a 7-(diethylamine)-4-methyl coumarin photoabsorber bound to the acrylic acid.

### Claim 3 (depends on 1)

The polymer of claim 1, is a copolymer of acrylic acid and methylmethacrylate.