# US 5,705,319 A · Process for forming fine patterns for a semiconductor device utilizing three photosensitive layers

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- Number: US 5,705,319 A
- Document ID: US5705319A
- Status: Granted
- Kind: A
- Application number: 08/656,972
- Filed: 1996-06-06
- Granted: 1998-01-06
- Earliest claimed: 1993-11-10
- Assignees: Hyundai Electronics Industries Co., Ltd.
- Inventors: Sang Man Bae; Seung Chan Moon
- Web page: https://patentgrep.com/patent/US5705319A

## CPC

- G03F 7/70466: {Multiple exposures, e.g. combination of fine and coarse exposures, double patterning or multiple exposures for printing a single feature (stitching G03F7/70475)}
- G03F 1/70: Adapting basic layout or design of masks to lithographic process requirements, e.g., second iteration correction of mask patterns for imaging
- G03F 7/00: Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (using photoresist structures for special production processes, see the relevant places, e.g. B44C, H10P76/00, H05K)
- G03F 7/0035: {Multiple processes, e.g. applying a further resist layer on an already in a previously step, processed pattern or textured surface}
- G03F 7/095: having more than one photosensitive layer (G03F7/075 takes precedence)
- G03F 7/2022: {Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure}
- G03F 7/265: {Selective reaction with inorganic or organometallic reagents after image-wise exposure, e.g. silylation}
- H10P 76/204: {of organic photoresist masks}
- H10P 76/2041: {Photolithographic processes}
- H10P 76/405: {characterised by their composition, e.g. multilayer masks}
- H10P 76/408: {characterised by their sizes, orientations, dispositions, behaviours or shapes}
- G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G)
- H10P: GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10

## Abstract

There are disclosed processes for forming fine patterns on a semiconductor substrate to a lesser degree than the resolving power of a step and repeat used, thereby improving the degree of integration of the semiconductor device. The process comprises the steps of: forming a first light-exposure mask and a second light-exposure mask with interlaced patterns selected from a plurality of fine patterns to be formed on a semiconductor substrate; coating an organic material layer on the semiconductor substrate; patterning the organic material layer by use of the first light-exposure mask, to form organic material layer patterns; forming a photosensitive film over the organic material layer patterns; and patterning the photosensitive film by use of the second light-exposure mask to form photosensitive film patterns, in such a way that each of photosensitive film patterns is interposed between two adjacent organic material layer patterns.

## Claims

### Claim 1

A process for forming fine patterns for a semiconductor device, comprising the steps of:
forming on a semiconductor substrate a lower layer with a first photosensitive film
forming an intermediate layer over the first photosensitive film;
forming on the intermediate layer an upper layer with an organic material layer and a second photosensitive film
selectively exposing the upper layer to a light by use of a first exposure mask having predetermined photointerceptive film patterns therein, and developing to form upper layer patterns which expose the intermediate layer selectively therethrough;
coating a third photosensitive film on the upper layer patterns and the intermediate layer;
selectively exposing the third photosensitive film by use of a second light-exposure mark, to form photosensitive film patterns, the second light-exposure mask having photointerceptive patterns each of which is alternated with each of the photointerceptive patterns of the first light-exposure mask so as not to overlap them with each other;
taking off the exposed areas of the intermediate layer through the photosensitive film patterns until the lower layer is exposed thereby forming intermediate patterns and then removing the upper layer patterns and the photosensitive film patterns;
taking off the exposed areas of the lower layer through the intermediate patterns, to form lower layer patterns; and
taking off the intermediate patterns.

### Claim 2 (depends on 1)

A process in accordance with claim 1, wherein the intermediate layer is subjected to anisotropic etch in a reactive ion etching manner.