# US 5,705,317 A · Radiation-sensitive mixture

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- Number: US 5,705,317 A
- Document ID: US5705317A
- Status: Granted
- Kind: A
- Application number: 08/567,775
- Filed: 1995-12-05
- Granted: 1998-01-06
- Earliest claimed: 1994-12-15
- Assignees: Agfa-Gevaert
- Inventors: Mathias Eichhorn; Gerhard Buhr
- Web page: https://patentgrep.com/patent/US5705317A

## CPC

- G03F 7/0045: {with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors}
- G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G)

## Abstract

A radiation-sensitive mixture which contains (a) a compound of the formula (I) ##STR1## where R.sup.1 is an optionally substituted alkyl radical, R.sup.2 is a hydrogen atom or an optionally substituted alkyl radical containing 1 to 4 carbon atoms, R.sup.3 is an n-valent, optionally polymeric aliphatic or aromatic radical and n is a number from 1 to 100; and b) a compound which forms a strong acid on exposure to actinic radiation.

## Claims

### Claim 1

A radiation-sensitive mixture which comprises
(a) a compound having at least one acid-cleavable C--O--C bond of the formula (I) ##STR3## where R.sup.1 is an optionally substituted alkyl radical,
R.sup.2 is a hydrogen atom or an optionally substituted alkyl radical containing 1 to 4 carbon atoms,
R.sup.3 is an n-valent, optionally polymeric, aliphatic or aromatic radical, and
n is an integer from 2 to 100
(b) a compound which forms a strong acid on exposure to actinic radiation.

### Claim 2 (depends on 1)

A radiation-sensitive mixture as claimed in claim 1, wherein R.sup.3 is a radical containing 1 to 3 aromatic nuclei and n is an integer from 2 to 4.

### Claim 3 (depends on 1)

A radiation-sensitive mixture as claimed in claim 1, wherein R.sup.1 is an alkyl radical containing 1 to carbon atoms.

### Claim 4 (depends on 1)

A radiation-sensitive mixture as claimed in claim 1, wherein R.sup.2 is a hydrogen atom or a methyl group.

### Claim 5 (depends on 1)

A radiation-sensitive mixture as claimed in claim 1, wherein R.sup.3 is the radical of a polymer containing carboxyl groups.

### Claim 6 (depends on 1)

A radiation-sensitive mixture as claimed in claim 1, which additionally comprises
(c) a polymeric water-insoluble binder which is soluble or swellable in aqueous alkaline solutions.

### Claim 7 (depends on 1)

A radiation-sensitive mixture as claimed in claim 1, wherein the compound (b) is an onium salt.

### Claim 8 (depends on 1)

A radiation-sensitive mixture as claimed in claim 1, which contains 5 to 90% by weight of acid-cleavable compound (a), 0.1 to 40% by weight of acid-forming compound (b), and 0 to 90% by weight of an alkali-soluble binder (c), based on the total solids of the mixture.

### Claim 9 (depends on 1)

A radiation-sensitive mixture as claimed in claim 1, wherein R.sup.1 is a secondary or tertiary alkyl radical.

### Claim 10 (depends on 1)

A radiation-sensitive mixture as claimed in claim 1, wherein n is an integer from 2 to 4.

### Claim 11 (depends on 5)

A radiation-sensitive mixture as claimed in claim 5, wherein the polymer has a molecular weight M.sub.w of 5,000 to 200,000.

### Claim 12 (depends on 5)

A radiation-sensitive mixture as claimed in claim 5, wherein the polymer is an addition polymer formed from unsaturated monomers.

### Claim 13 (depends on 12)

A radiation-sensitive mixture as claimed in claim 12, wherein the polymer is a copolymer of one or more (meth)acrylic acids and one or more (meth)acrylates.

### Claim 14 (depends on 1)

A radiation-sensitive mixture as claimed in claim 1, wherein R.sup.1 is tert-butyl.

### Claim 15 (depends on 1)

A radiation-sensitive mixture as claimed in claim 1, which is positive-working.

### Claim 16 (depends on 1)

A substrate coated with a mixture as claimed in claim 1.

### Claim 17 (depends on 1)

A radiation-sensitive mixture as claimed in claim 1, wherein n is 2 or 3.

### Claim 18 (depends on 1)

A radiation-sensitive mixture as claimed in claim 1, wherein n is an integer from 10 to 100.

### Claim 19

A composition prepared by mixing
(a) a compound having at least one acid-clearable C--O--C bond of the formula (I) ##STR4## where R.sup.1 is an optionally substituted alkyl radical,
R.sup.2 is a hydrogen atom or an optionally substituted alkyl radical containing 1 to 4 carbon atoms,
R.sup.3 is an n-valent, optionally polymeric, aliphatic or aromatic radical, and
n is an integer from 2 to 100, and
(b) a compound which forms a strong acid on exposure to actinic radiation.

### Claim 20 (depends on 19)

A substrate coated with a mixture as claimed in claim 19.

### Claim 21 (depends on 16)

A process for forming an image comprising:
(a) exposing the radiation-sensitive mixture of claim 16, and
(b) developing the exposed material.