# US 5,702,820 A · Photo-imaging resist ink and cured product thereof

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- Number: US 5,702,820 A
- Document ID: US5702820A
- Status: Granted
- Kind: A
- Application number: 08/660,839
- Filed: 1996-06-10
- Granted: 1997-12-30
- Earliest claimed: 1994-01-17
- Assignees: Nippon Kayaku Kabushiki Kaisha; Nippon Polytech Corp.
- Inventors: Minoru Yokoshima; Tetsuo Ohkubo; Kazunori Sasahara; Yoneji Sato; Yoko Baba
- Web page: https://patentgrep.com/patent/US5702820A

## CPC

- H05K 3/287: {Photosensitive compositions}
- C08F 290/064: {Polymers containing more than one epoxy group per molecule}
- C08F 299/026: {from the reaction products of polyepoxides and unsaturated monocarboxylic acids, their anhydrides, halogenides or esters with low molecular weight}
- G03F 7/038: Macromolecular compounds which are rendered insoluble or differentially wettable (G03F7/075 takes precedence; macromolecular azides G03F7/012; macromolecular diazonium compounds G03F7/021)
- Y10S 430/111: Polymer of unsaturated acid or ester
- Y10S 525/922: Polyepoxide polymer having been reacted to yield terminal ethylenic unsaturation
- Y10T 428/31511: Of epoxy ether
- H05K: PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- C08F: MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G)
- Y10S: TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10T: TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION

## Abstract

There is disclosed a photo-imaging resist ink containing (A) an unsaturated group-containing polycarboxylic acid resin which is a reaction product of (c) succinic anhydride with an additive reaction product of (a) an epoxy resin with (b) an unsaturated group-containing monocarboxylic acid, wherein (a) the epoxy resin is represented by the following formula (1): ##STR1## wherein M stands for ##STR2## n is at least 1 on the average; and m is 1 to n on the average. The resist ink is excellent in developability and photosensitivity, while the cured product thereof is excellent in flex resistance and folding resistance, and well satisfactory in adhesion, pencil hardness, solvent resistance, acid resistance, heat resistance, etc.

## Claims

### Claim 1

A photo-imaging resist ink containing (A) an unsaturated group-containing polycarboxylic acid resin which is a reaction product of (c) succinic anhydride with an additive reaction product of (a) an epoxy resin with (b) an unsaturated group-containing monocarboxylic acid, wherein (a) said epoxy resin is represented by the following formula (1): ##STR7## wherein M stands for ##STR8## n is at least 1 on the average; and m is 1 to n on the average, wherein (A) said unsaturated group containing polycarboxylic acid resin is prepared by reacting (a) said epoxy resin with 0.8 to 1.3 mol, per equivalent of the epoxy groups of said epoxy resin, of (b) said unsaturated group containing monocarboxylic acid to form the said additive reaction product, and subsequently reacting said additive reaction product with 0.1 to 0.9 equivalent, per equivalent of the hydroxyl groups of said additive reaction product, of .COPYRGT. succinic anhydride.

### Claim 2 (depends on 1)

A photo-imaging resist ink as claimed in claim 1, wherein n is 1 to 10 on the average.

### Claim 3 (depends on 1)

A photo-imaging resist ink as claimed in claim 1, wherein the acid value of (A) said unsaturated group-containing polycarboxylic acid resin is 40 to 110 mg.multidot.KOH/g.

### Claim 4 (depends on 1)

A photo-imaging resist ink as claimed in claim 1, wherein the amount of (A) said unsaturated group-containing polycarboxylic acid resin is 10 to 80 wt. % based on the total amount of the resist ink.

### Claim 5 (depends on 1)

A photo-imaging resist ink as claimed in claim 1, wherein (b) said unsaturated group-containing monocarboxylic acid is a member selected from the group consisting of acrylic acid, acrylic acid dimer, methacrylic acid, .beta.-styrylacrylic acid, .beta.-furfurylacrylic acid, crotonic acid, .alpha.-cyanocinnamic acid, cinnamic acid, half esters as reaction products of saturated or unsaturated dibasic anhydride with a (meth)acrylate compound having one hydroxyl group per molecule, half esters as reaction products of a saturated or unsaturated dibasic acid with an unsaturated group-containing monoglycidyl compound, and mixtures thereof.

### Claim 6 (depends on 1)

A photo-imaging resist ink as claimed in claim 1, wherein (b) said unsaturated group-containing monocarboxylic acid is acrylic acid.

### Claim 7 (depends on 1)

A photo-imaging resist ink comprising (A) an unsaturated group-containing polycarboxylic acid resin as claimed in claim 1, (B) a photopolymerization initiator, (C) a diluent, and (D) a curing component.

### Claim 8 (depends on 1, 7)

A photo-imaging resist ink as claimed in claim 1 or 7, which is a solder resist ink.

### Claim 9 (depends on 1, 7)

A cured product of a photo-imaging resist ink as claimed in claim 1 or 7.

### Claim 10 (depends on 1, 7)

A process for curing a photo-imaging resist ink, comprising coating a substrate with a photo-imaging resist ink as claimed in claim 1 or 7, and subsequently irradiating the coated surface of said substrate with ultraviolet light.