# US 5,702,568 A · Method of forming a via hole of a semiconductor device with spin-on-glass film sealed by an oxide film

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- Number: US 5,702,568 A
- Document ID: US5702568A
- Status: Granted
- Kind: A
- Application number: 08/668,845
- Filed: 1996-06-24
- Granted: 1997-12-30
- Earliest claimed: 1995-06-24
- Assignees: Hyundai Electronics Industries Co., Ltd.
- Inventors: Chan Soo Shin; Choon Hwan Kim
- Web page: https://patentgrep.com/patent/US5702568A

## CPC

- H10W 20/071: {of dielectric parts thereof}
- H10W: GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10

## Abstract

The present invention discloses a method of forming a via hole of a semiconductor device, which includes the steps of: forming a plurality of first metal wires on a wafer; after coating a SOG film on the first oxide film, forming a groove in the SOG film using a mask in which a via hole contact is formed, the size of which is bigger than that of the real via hole to be formed in it; performing a process of filling up completely the groove portion (a two-step process for the first embodiment or a one-step process for the second embodiment); and forming a via hole using a contact mask the size of which is the same as that of the real via hole.

## Claims

### Claim 1

A method of forming a via hole of a semiconductor device, comprising the steps of:
providing a wafer having a plurality of metal wires;
forming a first oxide film on said wafer including said metal wires;
coating a first SOG film on said first oxide film;
forming a groove of a first cross sectional width by overetching a portion of said first SOG film enough to expose a portion of said first oxide film;
forming a second thin oxide film on said first SOG film in which said groove is formed;
filling up said groove by coating a second SOG film on said second oxide film;
to form a via hole having a second cross sectional width smaller than said first cross sectional of said groove; and
removing a remaining portion of said second SOG film.