# US 5,700,330 A · Process for cleaning water and organic solvent based lacquer from equipment using a single solvent mixture

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- Number: US 5,700,330 A
- Document ID: US5700330A
- Status: Granted
- Kind: A
- Application number: 08/585,295
- Filed: 1996-01-11
- Granted: 1997-12-23
- Earliest claimed: 1995-01-20
- Assignees: Herberts GmbH
- Inventors: Wolfgang Stricker; Udo Hellmann; Werner Stephan
- Web page: https://patentgrep.com/patent/US5700330A

## CPC

- C11D 7/5022: {containing oxygen}
- C09D 9/005: {containing organic solvents}
- C11D 7/263: {Ethers}
- C11D 7/264: {Aldehydes; Ketones; Acetals or ketals}
- C11D: DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C09D: COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR (cosmetics A61K; processes for applying liquids or other fluent materials to surfaces, in general, B05D; staining wood B27K5/02; glazes or vitreous enamels C03C; natural resins, French polish, drying-oils, driers, turpentine, per se, C09F; polishing compositions other than French polish, ski waxes C09G; adhesives or use of materials as adhesives C09J; materials for sealing or packing joints or covers C09K3/10; materials for stopping leaks C09K3/12; processes for the electrolytic or electrophoretic production of coatings C25D)

## Abstract

Process for cleaning equipment and equipment cleaner for implementing the process. The invention relates to a process for cleaning equipment contaminated with lacquer residues, in which the lacquer residues are removed with a solvent mixture and an equipment cleaner based on a solvent mixture for implementing the process. The solvent mixture contains A) 15-35 wt. % of one or more glycol ethers of the general formula I OH--(CH.sub.2 --CH.sub.2 --O).sub.m --R.sub.1 I where R.sub.1 =C.sub.1-4 -alkyl and m=1 or 2 and B) 65-85 wt. % of one or more aliphatic ketones of the general formula II ##STR1## where R.sub.2=C.sub.1-3 -alkyl and R.sub.3 =C.sub.1-3 -alkyl and R.sub.2 and R.sub.3 may be identical or different.

## Claims

### Claim 1

A process for cleaning equipment contaminated with a lacquer residue, comprising:
contacting the equipment, which has been contaminated with either an organic solvent-based lacquer residue or an aqueous-based lacquer residue, with a solvent mixture to remove the lacquer residue, wherein the solvent mixture consists essentially of:
A) 15-35 wt. % of one or more glycol ethers of the general formula I
OH--(CH.sub.2 --CH.sub.2 --O).sub.m --R.sub.1 I
wherein R.sub.1 =C.sub.1-4 -alkyl and m=1 or 2 and
B) 65-85 wt. % of one or more aliphatic ketones of the general formula II ##STR4## wherein R.sub.2 =C.sub.1-3 -alkyl and R.sub.3 =C.sub.1-3 =alkyl and R.sub.2 and R.sub.3 may be identical or different, and wherein the A)+B) wt. %'s add up to 100 wt. %.

### Claim 2 (depends on 1)

A process according to claim 1, wherein methyl diglycol or butyl diglycol or a mixture thereof is used as Component A.

### Claim 3 (depends on 1)

A process according to claim 1, wherein acetone or methylethylketone or a mixture thereof is used as Component B.

### Claim 4 (depends on 1)

A process according to claim 1, further comprising precleaning the equipment with water wherein the equipment is contaminated with a residue of a water-based lacquer.