Sidewall strap
AssigneeInternational Business Machines Corporation
InventorsChung Hon Lam, James S. Nakos, Donald McAlpine Kenney, Eric Adler
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AssigneeInternational Business Machines Corporation
InventorsChung Hon Lam, James S. Nakos, Donald McAlpine Kenney, Eric Adler
Estimating the term…
The present invention is a sidewall connector providing a conductive path linking at least two conductive regions. The sidewall connector has a top portion comprising surface. A conductive member contacts the top portion, connecting the rail to a conductive region or to an external conductor. An etch stop layer located on a conductive region can be used to protect the conductive region during the directional etch to form the sidewall connector. A conductive bridge is then used to link exposed portions of the conductive region and the conductive sidewall rail, the conductive bridge extending across the thickness of the etch stop layer. A "T" connector is formed by the process, starting with a pair of intersecting sidewalls wherein the two sidewalls have top edges at different heights where they intersect. The connector is used to form a strap for a DRAM cell.
A semiconductor structure, comprising:
A sidewall connector for semiconductor devices comprising:
A semiconductor structure, comprising:
Dependencies are inferred from the claim text.