Pattern forming material including photoacid and photobase generators for large exposure latitude
AssigneeHoechst Japan Limited
InventorsTakanori Kudo, Seiya Masuda, Yoshiaki Kinoshita, Klaus Przybilla, Natsumi Endo, Natsumi Suehiro, Hiroshi Okazaki
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Abstract
A material for the formation of a pattern is provided which has a wide exposure latitude and is less liable to cause a dimensional change of a pattern with a change in exposure. The material comprises (A) a compound having a capability of producing an acid upon irradiation with an active beam, (B) a compound capable of producing a base or increasing its basicity, (C) a compound having at least one bond clearable with an acid and/or (D) a compound insoluble in water but soluble in an aqueous alkaline solution.
Claims9
A material for the formation of a pattern, comprising:
- (A)' a compound capable of producing an acid upon irradiation with an active beam,
- (B) a compound capable of increasing its basicity upon irradiation with an active beam,
- (C) a compound having at least one bond cleavable with an acid and/or
- (D) a polymer insoluble in water but soluble in an aqueous alkaline solution,
- wherein said compound capable of increasing its basicity upon irradiation with an active beam is selected from the group consisting of those represented by the general formula (IV) to (VII):
- ##STR7## wherein R.sup.1, R.sup.2 and R.sup.3, which may be the same or different from each other, independently represent a hydrogen atom or an alkyl group and X and Y, which may be the same or different from each other, independently represent an alkyl group, an alkoxy group, a halogen group, a nitro group or a hydrogen atom.
Dependencies are inferred from the claim text.