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US 5,688,987 AGranted
Non-subliming Mid-UV dyes and ultra-thin organic arcs having differential solubility
AssigneeBrewer Science Inc.
InventorsJim D. Meador, Xie Shao, Vandana Krishnamurthy, Earnest C. Murphy, Tony D. Flaim, Terry Lowell Brewer
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Abstract
Mid-UV dyes enabling ultra thin antireflection coatings for multi-layer i-line photoetching are produced from bichalcones; bis-a-cyanoacrylates/bis-cyanoacrylamides; and 1.4 divinylbenzenes. The dyes are nonsubliminal and differentially insoluble in standard photoresist solvents.
Claims3
An improved mid-UV anti-reflective dye of the type useful in ultra-thin sublayers of multi-layer i-line photoresist systems where said sublayer is sandwiched between a top i-line photoresist layer and a microelectronic substrate;
- the improved dye being characterized as non-subliming and exhibiting differential solubility, said dye being
- 1. 4-divinylbenzenes having terminal acetophenones which are substituted at the para (or 4-) ring position or, optionally, substituted in addition at the meta (or 3-) ring position.
Dependencies are inferred from the claim text.