Misted deposition method of fabricating layered superlattice materials
AssigneeSymetrix Corporation
InventorsLarry D. McMillan, Carlos A. Paz de Araujo, Michael C. Scott
Life of this patent
Estimating the term…
Loading patent…
AssigneeSymetrix Corporation
InventorsLarry D. McMillan, Carlos A. Paz de Araujo, Michael C. Scott
Estimating the term…
A precursor liquid comprising several metal 2-ethylhexanoates, such as stroritium tantalum and bismuth 2-ethylhexanoates, in a xylenes/methyl ethyl ketone solvent is prepared, a substrate is placed within a vacuum deposition chamber, the precursor liquid is misted, and the mist is flowed into the deposition chamber while maintaining the chamber at ambient temperature to deposit a layer of the precursor liquid on the substrate. The liquid is dried, baked, and annealed to form a thin film of a layered superlattice material, such as strontium bismuth tantalate, on the substrate. Then an integrated circuit is completed to include at least a potion of the layered superlattice material film in a component of the integrated circuit.
A method of fabricating a thin film of a layered superlattice material, said method comprising the steps of:
Dependencies are inferred from the claim text.